⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9410853 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL7575584 | 0.79 | — | — | |
| SCHEMBL10005619 | 0.76 | — | — | |
| SCHEMBL7172975 | 0.76 | — | — | |
| SCHEMBL9188991 | 0.74 | — | — | |
| SCHEMBL9181798 | 0.74 | — | — | |
| SCHEMBL9763411 | 0.72 | — | — | |
| SCHEMBL9063974 | 0.72 | — | — | |
| SCHEMBL8825497 | 0.72 | — | — | |
| SCHEMBL133734 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240352171-A1 | POLYDIMETHYLSILOXANE-CONTAINING MONOMER HAVING PHOSPHORYLCHOLINE GROUP AND HYDROXYL GROUP | NOF CORPORATION (JP) | 2024-10-24 | — | — | US | disclosed |
| EP-4397694-A1 | POLYDIMETHYLSILOXANE-CONTAINING MONOMER HAVING PHOSPHORYLCHOLINE GROUP AND HYDROXYL GROUP | NOF Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| CN-117568038-A | Etching composition and method for manufacturing semiconductor device using the same | 秀博瑞殷株式公社 | 2024-02-20 | — | — | CN | disclosed |
| CN-108291132-B | Etching composition and method for manufacturing semiconductor device using the same | 秀博瑞殷株式公社 | 2022-01-14 | — | — | CN | disclosed |
| CN-110475748-A | The Si oxide of the manufacturing method of the Si oxide of titaniferous, the manufacturing method of epoxides and titaniferous | SUMITOMO CHEMICAL CO | 2019-11-19 | — | — | CN | disclosed |
| CN-103254222-B | Fluorescent chemicals and preparation method thereof and fluorescence resin composition | 信越化学工业株式会社 | 2017-06-20 | — | — | CN | disclosed |
| CN-100398570-C | Mixed metallocene catalyst systems containing poor and good comonomer introducers | UNIVATION TECHNOLOGIES (US) | 2008-07-02 | — | — | CN | disclosed |
| CN-1547596-A | Mixed metallocene catalyst systems containing a poor comonomer incorporator and a good comonomer incorporator | �������ٶ������������ι�˾ | 2004-11-17 | — | — | CN | disclosed |
| CN-1545523-A | Low comonomer incorporating metallocene catalyst compounds | 尤尼威蒂恩技术有限责任公司 | 2004-11-10 | — | — | CN | disclosed |
| EP-0557762-B1 | Method for the chlorination of a silicon compound | SHINETSU CHEMICAL CO (JP) | 1997-07-16 | — | — | EP | disclosed |
| EP-0624591-A1 | Organosilicon compounds with cage structure | Wacker-Chemie GmbH (DE) | 1994-11-17 | — | — | EP | disclosed |
| US-5258535-A | Reaction with copper/II/ chloride in the presence of copper/I/ iodide | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-11-02 | — | — | US | disclosed |
| EP-0557762-A1 | Method for the chlorination of a silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-09-01 | — | — | EP | disclosed |