SCHEMBL8768045

SCHEMBL8768045

C(COCCCC1CO1)CC1CO1

nearest known ligand 0.56

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.56
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.48
ALDH1A1 P00352 6/20 0.48
TDP1 Q9NUW8 2/20 0.45
MAPK1 P28482 1/20 0.34
EPHX1 P07099 1/20 0.34
SPHK2 Q9NRA0 2/20 0.33
SPHK1 Q9NYA1 1/20 0.33
TP53 P04637 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2829800 0.97 TSHR (0.54) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL1984470 0.92 TSHR (0.61) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL2832720 0.90 TSHR (0.52) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL2829331 0.90 TSHR (0.58) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL3238852 0.90 TSHR (0.58) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL25435822 0.89 TSHR (0.46) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL17549874 0.89 TSHR (0.71) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL21339838 0.89 TSHR (0.46) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL3619783 0.89 ALDH1A1 (0.56) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL9885961 0.87 TSHR (0.77) TSHRMEN1KMT2ASMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0589329-B1 Antistatic film bases and photographic elements comprising said antistatic film bases MINNESOTA MINING & MFG (US) 1997-08-13 EP disclosed
EP-0745896-A1 Antistatic film bases and photographic elements comprising said antistatic film bases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-12-04 EP disclosed
US-5484693-A ELECTROCONDUCTIVE CROSSLINKED POLYMERS WITH STYRENESULFONIC ACID AND MALEIC ACID WITH EPOXIDE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-16 US disclosed
EP-0589329-A1 Antistatic film bases and photographic elements comprising said antistatic filmbases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-03-30 EP disclosed
US-5238706-A Photographic substrate coated with antistatic agent and crosslinking agent is rolled and heated to cure MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1993-08-24 US disclosed
EP-0486982-A1 Antistatic film bases and photographic elements comprising said antistatic film bases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-05-27 EP disclosed