Methylamine

Methylamine

SCHEMBL8768083

CN.C[SiH](C)[Si](C)(C)C

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1275267 0.89
Dimethylamine SCHEMBL6873817 0.76
SCHEMBL7599596 0.73
SCHEMBL16271846 0.70
Methylamine SCHEMBL4726267 0.65
SCHEMBL7785186 0.63
SCHEMBL4623366 0.63
SCHEMBL8765613 0.63
SCHEMBL1305096 0.63
SCHEMBL1268461 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240150681-A1 CLEANING AGENT COMPOSITION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICES AND METHOD FOR CLEANING SUBSTRATE FOR SEMICONDUCTOR DEVICES USING THE SAME SK Hynix Inc. (KR) 2024-05-09 US disclosed
EP-0628879-B1 Surface-imaging technique for lithographic processes for device fabrication AT & T CORP (US) 1997-08-13 EP disclosed
US-5550007-A Surface-imaging technique for lithographic processes for device fabrication LUCENT TECHNOLOGIES INC. (US) 1996-08-27 US disclosed
US-5487967-A Surface-imaging technique for lithographic processes for device fabrication AT&T CORP. (US) 1996-01-30 US disclosed
EP-0628879-A1 Surface-imaging technique for lithographic processes for device fabrication AT&T Corp. (US) 1994-12-14 EP disclosed