⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12987524 | 0.85 | — | — | |
| SCHEMBL12988927 | 0.83 | MEN1 (0.37) | — | |
| SCHEMBL19008 | 0.78 | — | — | |
| SCHEMBL422822 | 0.78 | — | — | |
| SCHEMBL6835983 | 0.77 | — | — | |
| SCHEMBL6902781 | 0.75 | TSHR (0.31) | — | |
| SCHEMBL7311713 | 0.74 | — | — | |
| SCHEMBL17097792 | 0.74 | — | — | |
| SCHEMBL1416121 | 0.74 | — | — | |
| SCHEMBL4195223 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109153658-B | Oxime ester derivative compound, photopolymerization initiator containing same, and photosensitive composition | 株式会社三养社 | 2022-11-22 | — | — | CN | claimed |
| CN-107422603-B | Photosensitive resin composition and photocured pattern produced therefrom | 东友精细化工有限公司 | 2022-03-08 | — | — | CN | claimed |
| CN-113227050-A | Carbazole poly-beta-oxime ester derivative compound, photopolymerization initiator containing carbazole poly-beta-oxime ester derivative compound, and photoresist composition | 株式会社三养社 | 2021-08-06 | — | — | CN | claimed |
| EP-3095778-B1 | OXIME ESTER FLUORENE COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING IT, PHOTORESIST COMPOSITION, USES OF THE PHOTORESIST COMPOSITION | SAMYANG CORP (KR) | 2020-12-16 | — | — | EP | claimed |
| WO-2020139042-A2 | CARBAZOLE MULTI BETA OXIME ESTER DERIVATIVE COMPOUND AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME | 주식회사 삼양사 | 2020-07-02 | — | — | WO | claimed |
| EP-2845845-B1 | NOVEL OXIMESTER FLUORINE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME | KOREA RES INST CHEMICAL TECH (KR) | 2019-07-03 | — | — | EP | claimed |
| US-20180356722-A1 | COLORED PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT SHIELDING SPACER PREPARED THEREFROM | ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) | 2018-12-13 | — | — | US | claimed |
| US-9873663-B2 | Fluorenyl β-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same | SAMYANG CORPORATION (KR) | 2018-01-23 | — | — | US | claimed |
| EP-3095778-A1 | NOVEL -OXIMESTER FLUORENE COMPOUND, A PHOTOPOLYMERIZATION INITIATOR COMPRISING SAME, AND PHOTORESIST COMPOSITION | Samyang Corporation (KR) | 2016-11-23 | — | — | EP | claimed |
| US-20160332960-A1 | NOVEL FLUORENYL B-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SAMYANG CORPORATION (KR) | 2016-11-17 | — | — | US | claimed |
| US-9316906-B2 | Fluorene oxime ester compound, photopolymerization initiator and photoresist composition containing the same | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2016-04-19 | — | — | US | claimed |
| US-20150111152-A1 | NOVEL FLUORENE OXIME ESTER COMPOUND, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2015-04-23 | — | — | US | claimed |
| EP-2845845-A1 | NOVEL OXIMESTER FLUORINE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME | Korea Research Institute of Chemical Technology (KR) | 2015-03-11 | — | — | EP | claimed |
| CN-109896990-B | Carbazole oxime ester derivative compound, photopolymerization initiator containing same, and photosensitive composition | 株式会社三养社 | 2023-04-21 | — | — | CN | disclosed |
| CN-109997080-B | Photoinitiator and light-shielding photosensitive resin composition containing same | 株式会社三养社 | 2022-12-23 | — | — | CN | disclosed |
| CN-109153658-B | Oxime ester derivative compound, photopolymerization initiator containing same, and photosensitive composition | 株式会社三养社 | 2022-11-22 | — | — | CN | disclosed |
| US-5332404-A | Monoazo dyes and fibers with blends | HOECHST MITSUBISHI KASEI CO., LTD. (JP) | 1994-07-26 | — | — | US | disclosed |
| EP-0579192-A1 | Monoazo disperse dyes and mixtures thereof | DyStar Japan Ltd. (JP) | 1994-01-19 | — | — | EP | disclosed |
| EP-0548715-A1 | Disperse dye mixtures | DyStar Japan Ltd. (JP) | 1993-06-30 | — | — | EP | disclosed |
| US-4918074-A | CALCIUM ANTAGONISTS | YOSHITOMI PHARMACEUTICAL INDUSTRIES, LTD. (JP) | 1990-04-17 | — | — | US | disclosed |