SCHEMBL8775238

SCHEMBL8775238

CCCCC(CC)COCC(O)COc1ccc(-c2nc(-c3ccccc3)nc(-c3ccc(OCC(O)COCC(CC)CCCC)cc3O)n2)c(O)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.38
GAA P10253 1/20 0.37
MAPK10 P53779 1/20 0.37
CNR1 P21554 1/20 0.37
CNR2 P34972 1/20 0.37
GPR55 Q9Y2T6 1/20 0.37
PLA2G4B P0C869 1/20 0.36
ALDH1A1 P00352 4/20 0.35
CA2 P00918 1/20 0.35
CYP3A4 P08684 1/20 0.35
MAPT P10636 4/20 0.35
HTT P42858 2/20 0.35
MAPK1 P28482 3/20 0.34
ALOX15 P16050 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
TSHR P16473 2/20 0.33
ATM Q13315 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10090881 0.98 MAPT (0.38) LMNAGAAMAPK10CNR1CNR2
SCHEMBL12755375 0.93 PLA2G4B (0.38) LMNAGAAPLA2G4BALDH1A1CA2
SCHEMBL15721420 0.91 TDP1 (0.38) LMNAGAAMAPK10CNR1CNR2
SCHEMBL29120353 0.91 LMNA (0.42) LMNAGAAMAPK10CNR1CNR2
SCHEMBL1290508 0.91 LMNA (0.42) LMNAGAAMAPK10CNR1CNR2
SCHEMBL27982321 0.90 PLA2G4B (0.33) LMNAGAACNR1CNR2GPR55
SCHEMBL23148523 0.89 PLA2G4B (0.39) CNR1CNR2GPR55PLA2G4BMAPK1
SCHEMBL29357507 0.89 LMNA (0.41) LMNAGAAMAPK10CNR1CNR2
SCHEMBL493631 0.89 LMNA (0.41) LMNAGAAMAPK10CNR1CNR2
SCHEMBL14997998 0.89 MAPT (0.31) LMNAGAAMAPK10CNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728712-B2 Polymerizable composition FUJIFILM CORPORATION (JP) 2014-05-20 US disclosed
US-20130143164-A1 POLYMERIZABLE COMPOSITION FUJIFILM CORPORATION (JP) 2013-06-06 US disclosed
EP-0520938-B1 UV-absorber containing photographic material CIBA GEIGY AG (CH) 1997-09-24 EP disclosed
US-5488108-A PROTECTIVE COATINGS FOR RADIATION RESISTANCE CIBA-GEIGY CORPORATION (US) 1996-01-30 US disclosed
US-5364749-A Photographic material containing UV absorber CIBA-GEIGY CORPORATION (US) 1994-11-15 US disclosed
EP-0520938-A1 UV-absorber containing photographic material CIBA-GEIGY AG (CH) 1992-12-30 EP disclosed