SCHEMBL8775477

SCHEMBL8775477

CCCCOCC(O)COc1ccc(-c2nc(OC)nc(-c3ccc(OCC(O)COCCCC)cc3O)n2)c(O)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLA2G4B P0C869 1/20 0.40
NPC1 O15118 2/20 0.40
ADRB2 P07550 6/20 0.39
ADRB1 P08588 3/20 0.39
CASR P41180 1/20 0.39
ALDH1A1 P00352 2/20 0.38
MAPT P10636 2/20 0.38
MEN1 O00255 1/20 0.38
GAA P10253 1/20 0.38
RAB9A P51151 1/20 0.38
KMT2A Q03164 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
ADRB3 P13945 2/20 0.36
LMNA P02545 1/20 0.35
HTT P42858 1/20 0.35
ATM Q13315 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TSHR P16473 1/20 0.34
MAPK1 P28482 1/20 0.34
CNR2 P34972 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL38782 0.93 PLA2G4B (0.45) PLA2G4BNPC1ADRB2ADRB1CASR
SCHEMBL29363492 0.93 PLA2G4B (0.45) PLA2G4BNPC1ADRB2ADRB1CASR
SCHEMBL7970264 0.90 ADRB2 (0.43) PLA2G4BNPC1ADRB2ADRB1CASR
SCHEMBL7522311 0.90 PLA2G4B (0.51) PLA2G4BNPC1ADRB2ADRB1ALDH1A1
SCHEMBL6562240 0.90 PLA2G4B (0.51) PLA2G4BNPC1ADRB2ADRB1ALDH1A1
SCHEMBL15127483 0.89 CASR (0.42) PLA2G4BNPC1ADRB2ADRB1CASR
SCHEMBL12755329 0.89 NPC1 (0.41) PLA2G4BNPC1ADRB2ADRB1ALDH1A1
SCHEMBL8775450 0.88 NPC1 (0.36) PLA2G4BNPC1ADRB2ADRB1ALDH1A1
SCHEMBL7987488 0.88 PLA2G4B (0.41) PLA2G4BNPC1ADRB2ADRB1CASR
SCHEMBL6471268 0.87 PLA2G4B (0.43) PLA2G4BNPC1ADRB2ADRB1CASR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0520938-B1 UV-absorber containing photographic material CIBA GEIGY AG (CH) 1997-09-24 EP disclosed
US-5488108-A PROTECTIVE COATINGS FOR RADIATION RESISTANCE CIBA-GEIGY CORPORATION (US) 1996-01-30 US disclosed
US-5364749-A Photographic material containing UV absorber CIBA-GEIGY CORPORATION (US) 1994-11-15 US disclosed
EP-0520938-A1 UV-absorber containing photographic material CIBA-GEIGY AG (CH) 1992-12-30 EP disclosed