SCHEMBL8775503

SCHEMBL8775503

FC(F)(F)C1=C(C(F)(F)F)C2C=CC1C1C=CC21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8593015 0.74
SCHEMBL8589040 0.65
SCHEMBL8836439 0.59
SCHEMBL6131450 0.57
SCHEMBL12985568 0.49
SCHEMBL1457465 0.48
SCHEMBL63469 0.47 ALDH1A1 (0.52)
SCHEMBL1360626 0.46
SCHEMBL14892844 0.44
SCHEMBL6520634 0.44

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0552382-B1 A TWO LAYER STRUCTURERESIST AND A PROCESS FOR PRODUCING IT TORAY INDUSTRIES (JP) 1997-11-19 EP disclosed
EP-0807111-A1 SUBSTITUTED HETEROCYCLIC COMPOUNDS, PREPARATION METHOD THEREFOR AND PHARMACEUTICAL COMPOSITIONS CONTAINING SAME SANOFI (FR) 1997-11-19 EP disclosed
EP-0552382-A1 DOUBLE-LAYER RESIST AND METHOD OF AND DEVICE FOR MAKING SAID RESIST TORAY INDUSTRIES, INC. (JP) 1993-07-28 EP disclosed
EP-0364368-A2 Electrically conductive layer-providing composition and process for formation of resist patterns FUJITSU LIMITED (JP) 1990-04-18 EP disclosed
EP-0080329-B1 POLYACETYLENE PRODUCTION The British Petroleum Company p.l.c. (GB) 1986-09-03 EP disclosed
EP-0173473-A2 Novel polymers and copolymers and production of poly(acetylene) The British Petroleum Company p.l.c. (GB) 1986-03-05 EP disclosed