SCHEMBL877587

SCHEMBL877587

C=CCOC(=O)C(C)(C)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.41
CYP3A4 P08684 1/20 0.39
TDP1 Q9NUW8 1/20 0.38
MAPT P10636 1/20 0.37
CACNA1B Q00975 1/20 0.37
APBA1 Q02410 1/20 0.37
ALDH1A1 P00352 4/20 0.34
HSD17B10 Q99714 3/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
RHOA P61586 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
KDM4E B2RXH2 2/20 0.31
HPGD P15428 2/20 0.31
TP53 P04637 1/20 0.31
PKM P14618 1/20 0.31
SNCA P37840 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
APP P05067 1/20 0.31
ADRB2 P07550 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6194635 0.86 TSHR (0.41) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL7866089 0.84 TSHR (0.42) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL194466 0.84 TSHR (0.42) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL8165023 0.83 TSHR (0.39) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL10454577 0.83 MAPT (0.39) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL4675516 0.82 TSHR (0.41) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL8517677 0.82 TSHR (0.41) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL9778370 0.81 TSHR (0.38) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL28947725 0.81 TSHR (0.42) TSHRCYP3A4TDP1MAPTCACNA1B
SCHEMBL4673298 0.80 TDP1 (0.41) TSHRCYP3A4TDP1MAPTCACNA1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 406 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110874025-B Diluent composition, substrate processing method and semiconductor element manufacturing method 易案爱富科技有限公司 2024-05-24 CN claimed
WO-2023169810-A1 PROCESS FOR PRODUCING ALPHA-HYDROXYISOBUTYRIC ACID METHYL ESTER, AND ITS USE IN THE ELECTRONICS INDUSTRY RÖHM GMBH (DE) 2023-09-14 WO claimed
CN-113336711-B Synthesis method of butafenacil 江苏省农用激素工程技术研究中心有限公司 2022-04-08 CN claimed
US-11220659-B2 Thinner composition ENF TECHNOLOGY CO., LTD. (KR) 2022-01-11 US claimed
CN-113336711-A Synthesis method of butafenacil 江苏省农用激素工程技术研究中心有限公司 2021-09-03 CN claimed
CN-110874025-A Thinner composition, substrate processing method and semiconductor device manufacturing method 易案爱富科技有限公司 2020-03-10 CN claimed
US-20200071640-A1 THINNER COMPOSITION ENF TECHNOLOGY CO., LTD. (KR) 2020-03-05 US claimed
CN-109289094-A Intravascular stent material and preparation method thereof 湖南博隽生物医药有限公司 2019-02-01 CN claimed
EP-3013471-B1 PROCESS FOR PRODUCTION OF METHACRYLIC ACID ESTERS ROHM & HAAS (US) 2017-12-27 EP claimed
US-9568830-B2 Thinner composition for improving coating and removing performance of resist DONGWOO FINE-CHEM CO., LTD. (KR) 2017-02-14 US claimed
US-5393918-A Hydrolysis of acetone cyanohydrin followed by esterification with alkyl alcohol, separation, dehydration ROHM AND HAAS COMPANY (US) 1995-02-28 US claimed
EP-0629671-A2 Solvent composition NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1994-12-21 EP claimed
US-5238774-A Photoresists, integrated circuits JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-24 US claimed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP claimed
EP-0457367-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-11-21 EP claimed
US-4771101-A Unsaturated polyesters colored with lignin EASTMAN KODAK COMPANY (US) 1988-09-13 US claimed
EP-0211667-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-02-25 EP claimed
US-4579967-A CONVERSION OF ALKYL ISOBUTYRATE VIA ALKYL HYDROPEROXYISOBUTYRATE AND ALKYL A-HYDROXYISOBUTYRATE CELANESE CORPORATION (US) 1986-04-01 US claimed
EP-0152103-A2 Process for producing methacrylate esters by dehydration of 2-hydroxy-2-methylpropionate esters E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-08-21 EP claimed
US-3974207-A Method for producing methacrylic esters Instyut Ciezkiej Syntesy Organiczej "Blachownia" (PO) 1976-08-10 US claimed