Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.52 |
| ▸ | ACHE | P22303 | 1/20 | 0.52 |
| ▸ | LDHA | P00338 | 3/20 | 0.47 |
| ▸ | LDHB | P07195 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.44 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.43 |
| ▸ | GLRA3 | O75311 | 1/20 | 0.42 |
| ▸ | GLRB | P48167 | 1/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.40 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 2/20 | 0.40 |
| ▸ | SLC37A4 | O43826 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2977807 | 0.86 | CYP3A4 (0.57) | CYP3A4ACHELDHALDHBMAPT | |
| 3-Methylorsellinic Acid SCHEMBL30016632 | 0.84 | CYP3A4 (0.61) | CYP3A4ACHELDHALDHBMAPT | |
| 3-Methylorsellinic Acid SCHEMBL963740 | 0.84 | CYP3A4 (0.61) | CYP3A4ACHELDHALDHBMAPT | |
| 3-Methylorsellinic Acid SCHEMBL31741224 | 0.84 | CYP3A4 (0.61) | CYP3A4ACHELDHALDHBMAPT | |
| SCHEMBL31335714 | 0.84 | CYP3A4 (0.54) | CYP3A4ACHELDHALDHBMAPT | |
| SCHEMBL14156171 | 0.84 | CYP3A4 (0.54) | CYP3A4ACHELDHALDHBMAPT | |
| SCHEMBL9042241 | 0.83 | CYP3A4 (0.52) | CYP3A4ACHELDHALDHBMAPT | |
| SCHEMBL9350983 | 0.83 | FFAR1 (0.52) | CYP3A4ACHELDHALDHBMAPT | |
| SCHEMBL14761042 | 0.82 | CYP3A4 (0.52) | CYP3A4ACHELDHALDHBMAPT | |
| SCHEMBL31643481 | 0.81 | LDHA (0.43) | CYP3A4ACHELDHALDHBMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11693313-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-20220179313-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-20220121118-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20210149303-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
| US-20200183273-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-11 | — | — | US | disclosed |
| US-20200183275-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-11 | — | — | US | disclosed |
| WO-2017051020-A1 | DYE COMPOSITION COMPRISING A RESORCINOL-BASED COUPLER AND AN OXIDATION BASE | L'OREAL (FR) | 2017-03-30 | — | — | WO | disclosed |
| EP-0490515-B1 | Method for preparing lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 1997-10-15 | — | — | EP | disclosed |
| US-5480762-A | Method for preparing lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-01-02 | — | — | US | disclosed |
| EP-0490515-A1 | Method for preparing lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1992-06-17 | — | — | EP | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| US-4572888-A | DRY FILM PHOTO RESISTS INCORPORATING A CARBOTHIO ACID AMIDE OR A THIO=HYDRAZIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1986-02-25 | — | — | US | disclosed |
| US-4443490-A | THERMOPLASTIC RESIN, IONIZING RADIATION, UNSATURATED COMPOUND, CALENDERING, CURING | SONY CORPORATION (JP) | 1984-04-17 | — | — | US | disclosed |
| US-4304838-A | FILMS FOR PEELABLE DEVELOPMENT | FUJI PHOTO FILM CO., LTD. (JP) | 1981-12-08 | — | — | US | disclosed |
| US-4175964-A | SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
| US-4171977-A | HEAT RESISTANCE, UNSATURATED MONOMER, PHOTOINITIATOR, CHLORINATED POLYOLEFIN BINDER | FUJI PHOTO FILM CO., LTD. (JP) | 1979-10-23 | — | — | US | disclosed |
| US-4058398-A | ETHYLENICALLY UNSATURATED MONOMER, POLYVINYL BUTYRAL, HETEROCYCLIC NITROGEN PHOTOINITIATOR | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11693313-B2 | Resist composition and method of forming resist pattern | C1R, C1S, C9 | CYP3A4 1267/4885ACHE 4679/4885LDHA 3408/4885 |
| US-20200183273-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | SLC11A2, RPP30, RDX | CYP3A4 2711/4885ACHE 4754/4885LDHA 1941/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.