SCHEMBL8777414

SCHEMBL8777414

CCCCCCCCSNC(N)=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 5/20 0.48
CES2 O00748 6/20 0.44
TP53 P04637 2/20 0.44
GMNN O75496 1/20 0.44
POLB P06746 1/20 0.44
MAPT P10636 1/20 0.44
THRB P10828 1/20 0.44
CYP2C9 P11712 1/20 0.44
BLM P54132 1/20 0.44
HSD17B10 Q99714 1/20 0.44
CES1 P23141 7/20 0.39
FAAH O00519 5/20 0.39
PLA2G6 O60733 1/20 0.39
CA2 P00918 1/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C19 P33261 1/20 0.38
SOAT1 P35610 1/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28331671 1.00 EPHX1 (0.48) EPHX1CES2TP53GMNNPOLB
SCHEMBL199561 1.00 EPHX1 (0.48) EPHX1CES2TP53GMNNPOLB
SCHEMBL27347625 1.00 EPHX1 (0.48) EPHX1CES2TP53GMNNPOLB
SCHEMBL4611729 1.00 EPHX1 (0.48) EPHX1CES2TP53GMNNPOLB
SCHEMBL11544996 1.00 EPHX1 (0.48) EPHX1CES2TP53GMNNPOLB
SCHEMBL28760871 1.00 EPHX1 (0.48) EPHX1CES2TP53GMNNPOLB
SCHEMBL7839954 1.00 EPHX1 (0.48) EPHX1CES2TP53GMNNPOLB
Hydrochloric Acid SCHEMBL10531008 0.98 EPHX1 (0.47) EPHX1CES2TP53GMNNPOLB
SCHEMBL561899 0.98 EPHX1 (0.46) EPHX1CES2TP53GMNNPOLB
SCHEMBL946019 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106132381-B It is used to prepare the monomer mixture of dental material 义获嘉伟瓦登特公司 2019-11-19 CN claimed
CN-106103348-B The purposes of sulphur compound and selenium compound as the precursor of nano structural material 哥伦比亚大学(纽约)理事会 2018-07-31 CN claimed
EP-0083075-B1 COLOUR DEVELOPING SHEET FOR A PRESSURE-SENSITIVE RECORDING SHEET JUJO PAPER CO., LTD. (JP) 1986-08-13 EP claimed
EP-4685163-A1 TWO-COMPONENT CURABLE COMPOSITION AND CURED PRODUCT Cosmo Oil Lubricants Co., Ltd. (JP) 2026-01-28 EP disclosed
WO-2024195843-A1 TWO-COMPONENT CURABLE COMPOSITION AND CURED PRODUCT コスモ石油ルブリカンツ株式会社 2024-09-26 WO disclosed
CN-106132381-B It is used to prepare the monomer mixture of dental material 义获嘉伟瓦登特公司 2019-11-19 CN disclosed
CN-110461951-A COMPOSITION, DICHROIC MATERIAL, LIGHT-ABSORBING ANISOTROPIC FILM, LAMINATE, AND IMAGE DISPLAY DEVICE FUJIFILM CORP 2019-11-15 CN disclosed
CN-105026367-B Method for producing isothiocyanate 旭化成株式会社 2019-05-21 CN disclosed
CN-108976155-A The manufacturing method of isothiocyanates 旭化成株式会社 2018-12-11 CN disclosed
CN-106565569-A Preparing method of isooctyl mercaptan 安徽绩溪县徽煌化工有限公司 2017-04-19 CN disclosed
EP-0513493-B1 Photosensitive resin composition NIPPON PAINT CO LTD (JP) 1997-12-17 EP disclosed
US-5344744-A For flexographic printing plate, water developable, elasticity wear resistance NIPPON PAINT CO., LTD. (JP) 1994-09-06 US disclosed
EP-0513493-A1 Photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1992-11-19 EP disclosed
US-5153331-A Reacting 6-epoxyethyl-3-oxatricyclo 3.2.1.0(2,4)!octane with a thiocyanate salt and/or a thiourea NIPPON OIL COMPANY, LTD. (JP) 1992-10-06 US disclosed
EP-0452092-A2 6-Epithioethyl-3-oxatricyclo (3.2.1.02.4) octane and process for preparation thereof NIPPON OIL CO. LTD. (JP) 1991-10-16 EP disclosed