SCHEMBL8778082

SCHEMBL8778082

COc1ccccc1C(=O)c1ccccc1C(=NO)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 2/20 0.51
▸ RAB9A P51151 2/20 0.51
▸ ALDH1A1 P00352 2/20 0.51
▸ MAPT P10636 3/20 0.49
▸ MGLL Q99685 2/20 0.46
▸ KDM4E B2RXH2 4/20 0.46
▸ HTT P42858 2/20 0.46
▸ CDC25B P30305 1/20 0.46
▸ KCNK3 O14649 1/20 0.45
▸ KCNK9 Q9NPC2 1/20 0.45
▸ STS P08842 1/20 0.45
▸ HSD17B10 Q99714 3/20 0.44
▸ ALOX15 P16050 2/20 0.44
▸ MAPK1 P28482 1/20 0.44
▸ TP53 P04637 1/20 0.44
▸ GAA P10253 1/20 0.44
▸ CTSD P07339 1/20 0.44
▸ LMNA P02545 3/20 0.44
▸ KMT2A Q03164 1/20 0.44
▸ CNR2 P34972 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3958758 0.87 KDM4E (0.52) NPC1RAB9AALDH1A1MAPTMGLL
SCHEMBL27789892 0.82 CTSD (0.60) NPC1RAB9AHTTCDC25BKCNK3
SCHEMBL10588485 0.81 KMT2A (0.57) NPC1RAB9AALDH1A1MAPTMGLL
SCHEMBL50229 0.80 MAPT (0.64) NPC1RAB9AALDH1A1MAPTKDM4E
SCHEMBL29573531 0.80 MAPT (0.64) NPC1RAB9AALDH1A1MAPTKDM4E
SCHEMBL27991433 0.80 AKR1C3 (0.61) ALDH1A1MAPTMGLLCDC25BHSD17B10
SCHEMBL322168 0.80 CTSD (0.62) NPC1RAB9AHTTKCNK3KCNK9
SCHEMBL29658169 0.80 CTSD (0.62) NPC1RAB9AHTTKCNK3KCNK9
Benzophenone SCHEMBL11416830 0.79 MAPT (0.67) NPC1RAB9AALDH1A1MAPTKDM4E
Bicarbonate SCHEMBL27740092 0.79 MAPT (0.62) NPC1RAB9AALDH1A1MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0332158-B1 RADIATION-SENSITIVE PHOTORESIST COMPOSITION FOR EXPOSURE TO DEEP ULTRAVIOLET RADIATION HOECHST CELANESE CORPORATION (US) 1993-05-26 — — EP claimed
EP-0332158-A2 Radiation-sensitive photoresist composition for exposure to deep ultraviolet radiation HOECHST CELANESE CORPORATION (US) 1989-09-13 — — EP claimed
EP-0576622-B1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK CO (US) 1997-11-05 — — EP disclosed
EP-0576622-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1994-01-05 — — EP disclosed
EP-0332158-B1 RADIATION-SENSITIVE PHOTORESIST COMPOSITION FOR EXPOSURE TO DEEP ULTRAVIOLET RADIATION HOECHST CELANESE CORPORATION (US) 1993-05-26 — — EP disclosed
WO-1992017821-A1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1992-10-15 — — WO disclosed
US-5141839-A LITHOGRAPHIC PRINTING PLATES HAVING A RADIATION-SENSITIVE LAYER COMPRISING A PHOTOCROSSLINKABLE POLYMER, A LEUCO DYE, A PHOTOOXIDANT AND A HETEROAROMATIC AMINE N-OXIDE EASTMAN KODAK COMPANY (US) 1992-08-25 — — US disclosed
US-5141842-A Negative working lithography printing plates EASTMAN KODAK COMPANY (US) 1992-08-25 — — US disclosed
US-5104770-A POSITIVE-WORKING PHOTORESIST COMPOSITIONS HOECHST CELANESE CORPORATION (US) 1992-04-14 — — US disclosed
EP-0332158-A2 Radiation-sensitive photoresist composition for exposure to deep ultraviolet radiation HOECHST CELANESE CORPORATION (US) 1989-09-13 — — EP disclosed
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