⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3695331 | 0.98 | — | — | |
| SCHEMBL21986584 | 0.91 | — | — | |
| SCHEMBL21066245 | 0.82 | — | — | |
| SCHEMBL3919513 | 0.82 | — | — | |
| SCHEMBL10707092 | 0.80 | LMNA (0.33) | — | |
| SCHEMBL9650554 | 0.80 | LMNA (0.33) | — | |
| SCHEMBL29210273 | 0.80 | LMNA (0.33) | — | |
| SCHEMBL8723434 | 0.77 | — | — | |
| SCHEMBL23825067 | 0.76 | — | — | |
| SCHEMBL1983112 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240067822-A1 | RESIN COMPOSITION, NONWOVEN FABRIC AND TEXTILE PRODUCT OBTAINED USING SAME, SEPARATOR FOR POWER STORAGE ELEMENT, SECONDARY BATTERY, AND ELECTRIC DOUBLE-LAYER CAPACITOR | TORAY INDUSTRIES, INC. (JP) | 2024-02-29 | — | — | US | disclosed |
| WO-2023238890-A1 | COMPOUND AND ANTISTATIC AGENT CONTAINING SAME AS ACTIVE INGREDIENT | 日本化学工業株式会社 | 2023-12-14 | — | — | WO | disclosed |
| CN-116249807-A | Resin composition, nonwoven fabric, and fibrous product, separator for electric storage element, secondary battery, and electric double layer capacitor using same | 东丽株式会社 | 2023-06-09 | — | — | CN | disclosed |
| EP-0468531-B2 | 2-Diazo-1,2-quinone compounds and image forming materials prepared using the compounds | FUJI PHOTO FILM CO LTD (JP) | 1997-11-12 | — | — | EP | disclosed |
| US-5514518-A | CHANGE IN POLARITY UPON EXPOSURE REDUCES ADHESIVENESS | FUJI PHOTO FILM CO., LTD. (JP) | 1996-05-07 | — | — | US | disclosed |
| US-5384227-A | Optical recording material with supports and light sensitive layers, for receiver sheets, photoresists and printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1995-01-24 | — | — | US | disclosed |
| US-5312905-A | Image forming materials | FUJI PHOTO FILM CO., LTD. (JP) | 1994-05-17 | — | — | US | disclosed |
| EP-0468531-A1 | 2-Diazo-1,2-quinone compounds and image forming materials prepared using the compounds | FUJI PHOTO FILM CO., LTD. (JP) | 1992-01-29 | — | — | EP | disclosed |