SCHEMBL880528

SCHEMBL880528

CC1CCC(C)N1C(=O)OC(C)(C)C

nearest known ligand 0.56

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.56
CHRM1 P11229 1/20 0.56
CHRM3 P20309 1/20 0.56
PREP P48147 4/20 0.45
HPGD P15428 1/20 0.42
USP2 O75604 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
RECQL P46063 1/20 0.40
EPHX1 P07099 1/20 0.40
NR1H2 P55055 1/20 0.40
HSD11B1 P28845 1/20 0.39
GPR119 Q8TDV5 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26805930 1.00 CHRM2 (0.56) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL12333780 1.00 CHRM2 (0.56) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL21441814 1.00 CHRM2 (0.56) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL2909390 0.92 CHRM2 (0.53) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL24350080 0.88 CHRM2 (0.54) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL15580385 0.88 CHRM2 (0.54) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL24372084 0.87 CHRM2 (0.56) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL25470765 0.87 CHRM2 (0.56) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL14665083 0.87 CHRM2 (0.49) CHRM2CHRM1CHRM3PREPHPGD
SCHEMBL20221053 0.85 CHRM2 (0.47) CHRM2CHRM1CHRM3PREPHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119955091-A Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component 信越化学工业株式会社 2025-05-09 CN disclosed
CN-118210199-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-115113484-A Positive photosensitive resin composition, positive photosensitive dry film, method for producing the same, and method for forming pattern 信越化学工业株式会社 2022-09-27 CN disclosed
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
CN-114253069-A Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film 信越化学工业株式会社 2022-03-29 CN disclosed
EP-3497093-B1 SULFONYL PYRIDYL TRP INHIBITORS HOFFMANN LA ROCHE (CH) 2021-09-15 EP disclosed
EP-3256463-B1 1-(HET)ARYLSULFONYL-(PYRROLIDINE OR PIPERIDINE)-2-CARBOXAMIDE DERIVATIVES AND THEIR USE AS TRPA1 ANTAGONISTS HOFFMANN LA ROCHE (CH) 2019-10-09 EP disclosed
US-10162260-B2 Photosensitive resin composition, protective film, and liquid crystal display element CHI MEI CORPORATION (TW) 2018-12-25 US disclosed
CN-107561863-A Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2018-01-09 CN disclosed
CN-106909028-A Photosensitive resin composition, protective film and liquid crystal display element 奇美实业股份有限公司 2017-06-30 CN disclosed
US-20170168390-A1 PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT CHI MEI CORPORATION (TW) 2017-06-15 US disclosed
US-20150293449-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2015-10-15 US disclosed
CN-104950580-A Photosensitive polysiloxane composition and application thereof CHI MEI CORP 2015-09-30 CN disclosed
CN-104375381-A Photosensitive polysiloxane composition, film formed by photosensitive polysiloxane composition and device comprising film CHI MEI CORP 2015-02-25 CN disclosed
US-20150050596-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2015-02-19 US disclosed
EP-2433936-A1 Substituted-quinoxaline-type-piperidine compounds and the uses thereof Purdue Pharma LP (US) 2012-03-28 EP disclosed
EP-2433937-A1 Substituted-quinoxaline-type-piperidine compounds and the uses thereof Purdue Pharma LP (US) 2012-03-28 EP disclosed
EP-2433935-A1 Substituted-quinoxaline-type-piperidine compounds and the uses thereof Purdue Pharma LP (US) 2012-03-28 EP disclosed
WO-2011090935-A1 PYRAZOLO[1,5-a]PYRIMIDINE COMPOUNDS AS mTOR INHIBITORS MERCK SHARP & DOHME CORP. (US) 2011-07-28 WO disclosed
WO-2009027820-A2 SUBSTITUTED-QUINOXALINE-TYPE-PIPERIDINE COMPOUNDS AND THE USES THEREOF PURDUE PHARMA L.P. (DE) 2009-03-05 WO disclosed