Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDR known ✓ | P35968 | 4/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
| ▸ | MAPT | P10636 | 6/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.49 |
| ▸ | LMNA | P02545 | 3/20 | 0.49 |
| ▸ | HTT | P42858 | 3/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.49 |
| ▸ | AURKB | Q96GD4 | 4/20 | 0.47 |
| ▸ | AURKA | O14965 | 3/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2353532 | 0.94 | MAPT (0.47) | MEN1KMT2AMAPTALDH1A1KDM4E | |
| SCHEMBL932442 | 0.78 | SMN1; SMN2 (0.73) | MAPTALDH1A1KDM4ESMN1; SMN2LMNA | |
| Toluene SCHEMBL180606 | 0.78 | SMN1; SMN2 (0.65) | MAPTALDH1A1KDM4ESMN1; SMN2LMNA | |
| SCHEMBL13836876 | 0.78 | SMN1; SMN2 (0.73) | MAPTALDH1A1KDM4ESMN1; SMN2LMNA | |
| Benzene SCHEMBL5085625 | 0.78 | SMN1; SMN2 (0.64) | MAPTALDH1A1KDM4ESMN1; SMN2LMNA | |
| Water SCHEMBL6305540 | 0.78 | GAA (0.56) | MEN1KMT2AMAPTALDH1A1KDM4E | |
| SCHEMBL11432043 | 0.78 | GAA (0.62) | MEN1KMT2AMAPTALDH1A1KDM4E | |
| SCHEMBL31313 | 0.78 | GAA (0.62) | MEN1KMT2AMAPTALDH1A1KDM4E | |
| SCHEMBL1705904 | 0.78 | GAA (0.62) | MEN1KMT2AMAPTALDH1A1KDM4E | |
| SCHEMBL34 | 0.78 | GAA (0.62) | MEN1KMT2AMAPTALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5683857-A | Method for forming resist pattern by irradiating a resist coating on a substrate, contacting the resist with organic solvent vapor and removing the irradiated portion | NIPPON PAINT CO., LTD. (JP) | 1997-11-04 | — | — | US | disclosed |
| EP-0626620-B1 | Method for forming resist pattern | NIPPON PAINT CO LTD (JP) | 1996-10-09 | — | — | EP | disclosed |
| EP-0626620-A1 | Method for forming resist pattern | Nippon Paint Co., Ltd. (JP) | 1994-11-30 | — | — | EP | disclosed |
| EP-0199672-B1 | OXIME SULPHONATES CONTAINING REACTIVE GROUPS | CIBA-GEIGY AG (CH) | 1988-06-01 | — | — | EP | disclosed |
| EP-0139609-B1 | PROCESS FOR CURING ACID-CURABLE LACQUERS | CIBA-GEIGY AG (CH) | 1987-02-04 | — | — | EP | disclosed |
| EP-0139609-A1 | Process for curing acid-curable lacquers | CIBA-GEIGY AG (CH) | 1985-05-02 | — | — | EP | disclosed |