SCHEMBL8829641

SCHEMBL8829641

[InH3].[InH3].[InH3].[InH3].[SnH4].[SnH4].[SnH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5145518 1.00
SCHEMBL8731245 1.00
SCHEMBL735758 0.82
SCHEMBL9460945 0.82
SCHEMBL7638450 0.82
SCHEMBL8931443 0.82
SCHEMBL11114731 0.82
SCHEMBL387227 0.82
Water SCHEMBL527768 0.82
SCHEMBL1180802 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5667631-A STRIKING A PLASMA FROM ETCHANT GAS INCLUDING ONE OR MORE SELECTED FROM HYDROGEN BROMIDE, HYDROGEN CHLORIDE, HYDROGEN IODIDE, CHLORINE, BROMINE AND IODINE IN LOW PRESSURE PLASMA REACTOR AND ETCHING INDIUM TIN OXIDE LAYER LAM RESEARCH CORPORATION (US) 1997-09-16 US disclosed