SCHEMBL8833003

SCHEMBL8833003

C[Si](C)(CCl)COCCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1470657 0.78
SCHEMBL58439 0.65
SCHEMBL202964 0.65
SCHEMBL2992565 0.65
SCHEMBL525705 0.62 ALDH1A1 (0.41)
SCHEMBL44786 0.62 ALDH1A1 (0.41)
SCHEMBL20357702 0.62 ALDH1A1 (0.41)
SCHEMBL1447159 0.62 ALDH1A1 (0.41)
SCHEMBL20450717 0.62 ALDH1A1 (0.41)
SCHEMBL8117603 0.62 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed
US-5080971-A Durable, weatherproof, wear and corrosion resistant TDK CORPORATION (JP) 1992-01-14 US disclosed
US-5069967-A Durability, thin metal film. plasma polymerized film, fluoropo lymer film TDK CORPORATION (JP) 1991-12-03 US disclosed
US-4988573-A MAGNETIC RECORDING MEDIA, PLASMA POLYMERIZED FILM ON A SURFACE SUCH AS A TAPE OR DISK TDK CORPORATION (JP) 1991-01-29 US disclosed
US-4880687-A Magnetic recording medium TDK CORPORATION (JP) 1989-11-14 US disclosed
US-4599266-A SILOXANE POLYMNER FILM COVERING METAL, LAYERR TDK CORPORATION (JP) 1986-07-08 US disclosed