SCHEMBL8844362

SCHEMBL8844362

CC(=O)OC(C)N(C(C)OC(C)=O)C(C)OC(C)=O

nearest known ligand 0.55

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.55
CHRM2 P08172 1/20 0.41
CHRM4 P08173 1/20 0.41
CHRM1 P11229 1/20 0.41
TBXA2R P21731 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.39
GALR3 O60755 1/20 0.39
MAPT P10636 1/20 0.39
BLM P54132 1/20 0.39
ALDH1A1 P00352 2/20 0.35
TRPV1 Q8NER1 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ALOX15 P16050 1/20 0.32
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
HRH1 P35367 1/20 0.30
KMT2A Q03164 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL291530 0.80
SCHEMBL6937326 0.76 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL5932147 0.76 TSHR (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL4633810 0.74 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL5933357 0.74 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL609709 0.74 TSHR (0.46) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL11465609 0.74 TSHR (0.45) TSHRALDH1A1TDP1
Hydrochloric Acid SCHEMBL28375443 0.72 TSHR (0.44) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL8973547 0.72 MGAM (0.48) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL987906 0.71 TSHR (0.65) TSHRCHRM2CHRM4CHRM1TBXA2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113527101-B Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component 信越化学工业株式会社 2024-04-23 CN disclosed
CN-113527680-B Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2023-04-28 CN disclosed
US-5698108-A MIXTURE OF WATER SOLUBLE LIGNOSULFATE, ALKYLENE POLYAMINE AND WATER VININGS INDUSTRIES, INC. (US) 1997-12-16 US disclosed