SCHEMBL291530

SCHEMBL291530

CC(=O)OC(C)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9794923 0.84 TSHR (0.42)
SCHEMBL8844362 0.80 TSHR (0.55)
SCHEMBL8006073 0.80 TSHR (0.35)
SCHEMBL6937326 0.79 TSHR (0.48)
SCHEMBL27695725 0.79 TSHR (0.48)
SCHEMBL8006079 0.78
SCHEMBL9427817 0.78
SCHEMBL3907590 0.76
SCHEMBL5885285 0.76 CHRNB2 (0.39)
SCHEMBL9633916 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 648 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119956563-A Preparation method of super-hydrophobic electrostatic spinning film 华懋(厦门)特种材料有限公司 2025-05-09 CN claimed
CN-118344827-A UV (ultraviolet) visbreaking optical adhesive solidified by visible light and preparation method thereof 浙江万亿星新材料科技有限公司 2024-07-16 CN claimed
CN-118272011-A Ultraviolet absorbing optical adhesive solidified by visible light and preparation method thereof 浙江万亿星新材料科技有限公司 2024-07-02 CN claimed
CN-113620825-B Microchannel reactor and method for preparing ethyl dimethylaminoacetate by using microchannel reactor 浙江海昇药业股份有限公司 2023-10-13 CN claimed
CN-115047715-A Positive photosensitive polybenzoxazole resin composition, preparation method and application thereof 南通晶爱微电子科技有限公司 2022-09-13 CN claimed
CN-114895527-A Positive photosensitive resin precursor composition, preparation method and application thereof 南通晶爱微电子科技有限公司 2022-08-12 CN claimed
CN-113620825-A Micro-channel reactor and method for preparing dimethylamino ethyl acetate by using same 浙江海昇药业股份有限公司 2021-11-09 CN claimed
US-9102647-B2 Method for preparing lactide using an ionic solvent HYUNDAI MOTOR COMPANY (KR) 2015-08-11 US claimed
US-20140187798-A1 METHOD FOR PREPARING LACTIDE USING AN IONIC SOLVENT HYUNDAI MOTOR COMPANY (KR) 2014-07-03 US claimed
JP-10072474-A None JP disclosed
JP-3084021-A None JP disclosed
CN-122055676-A Resin composition, cured product, display device, or semiconductor device 东丽株式会社 2026-05-15 CN disclosed
CN-122029489-A Photosensitive resin composition, cured product, display device, and electronic component 东丽株式会社 2026-05-12 CN disclosed
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
EP-0010805-A1 Powder coating, process for the preparation thereof and articles coated therewith UNILEVER N.V. (NL) 1980-05-14 EP disclosed
US-4153349-A Soft contact lens with thin edge NPD TECHNOLOGIES, INC. (US) 1979-05-08 US disclosed
US-4012437-A Method of producing betaines, monomers and polymers containing betaine-type units and novel and useful copolymers thereby obtained ROHM AND HAAS COMPANY (US) 1977-03-15 US disclosed
US-3990381-A Hydrophilic polymer coating for underwater structures NATIONAL PATENT DEVELOPMENT CORPORATION (US) 1976-11-09 US disclosed
US-3964973-A Preparation of insoluble biologically active compounds CESKOSLOVENSKA AKADEMIE VED (CS) 1976-06-22 US disclosed
US-3931123-A HYDROPHILIC NITRITE COPOLYMERS CESKOSLOVENSKA AKADAMIE VED (CS) 1976-01-06 US disclosed