Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | MAPT | P10636 | 4/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.37 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.37 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.32 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11350092 | 1.00 | ALDH1A1 (0.37) | ALDH1A1MAPTKDM4EMAPK1POLB | |
| Hydrochloric Acid SCHEMBL22771758 | 0.97 | MAPT (0.36) | ALDH1A1MAPTKDM4EMAPK1POLB | |
| Hydrochloric Acid SCHEMBL22771759 | 0.97 | MAPT (0.36) | ALDH1A1MAPTKDM4EMAPK1POLB | |
| SCHEMBL26467913 | 0.78 | HRH3 (0.33) | KDM4ECYP3A4 | |
| SCHEMBL15901902 | 0.78 | HRH3 (0.33) | KDM4ECYP3A4 | |
| Hydrochloric Acid SCHEMBL22771620 | 0.76 | HRH3 (0.32) | CYP3A4 | |
| Hydrochloric Acid SCHEMBL22771619 | 0.76 | HRH3 (0.32) | CYP3A4 | |
| SCHEMBL21084358 | 0.76 | — | — | |
| SCHEMBL20558675 | 0.74 | — | — | |
| SCHEMBL20558676 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | claimed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | claimed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | claimed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | claimed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | claimed |
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | disclosed |
| US-11248064-B2 | Conjugated diene polymer, conjugated diene polymer composition, and tire | JAPAN ELASTOMER CO., LTD. (JP) | 2022-02-15 | — | — | US | disclosed |
| CN-110167977-B | Conjugated diene polymer, conjugated diene polymer composition, and tire | 日本弹性体株式会社 | 2021-11-16 | — | — | CN | disclosed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | disclosed |
| CN-109476778-B | Modified conjugated diene polymer, modified conjugated diene polymer composition, tire, and method for producing modified conjugated diene polymer | 日本弹性体株式会社 | 2021-05-11 | — | — | CN | disclosed |
| EP-3581597-B1 | CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER COMPOSITION, AND TIRE | JAPAN ELASTOMER CO LTD (JP) | 2021-05-05 | — | — | EP | disclosed |
| CN-107250172-B | Modified conjugated diene polymer, method for producing same, and modified conjugated diene polymer composition | 旭化成株式会社 | 2021-04-09 | — | — | CN | disclosed |
| EP-3260476-A1 | MODIFIED CONJUGATED DIENE-BASED POLYMER, MANUFACTURING METHOD THEREOF, AND MODIFIED CONJUGATED DIENE-BASED POLYMER COMPOSITION | Asahi Kasei Kabushiki Kaisha (JP) | 2017-12-27 | — | — | EP | disclosed |
| CN-107250172-A | Modified conjugated diene polymer and its manufacture method and modified conjugated diene polymer composition | 旭化成株式会社 | 2017-10-13 | — | — | CN | disclosed |
| US-9085653-B2 | Method for producing modified conjugated diene-based polymer, modified conjugated diene-based polymer, modified conjugated diene-based polymer composition, rubber composition and tire | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| EP-2754674-B1 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER, MODIFIED CONJUGATED DIENE POLYMER, MODIFIED CONJUGATED DIENE POLYMER COMPOSITION, RUBBER COMPOSITION, AND TIRE | ASAHI KASEI CHEMICALS CORP (JP) | 2015-03-11 | — | — | EP | disclosed |
| US-20140213721-A1 | Method for Producing Modified Conjugated Diene-Based Polymer, Modified Conjugated Diene-Based Polymer, Modified Conjugated Diene-Based Polymer Composition, Rubber Composition and Tire | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |
| EP-0372313-B1 | Sulfonated phenyl phosphine-containing complexes | HOECHST AG (DE) | 1997-03-05 | — | — | EP | disclosed |
| US-5155274-A | Catalyst for amination of unsaturated compounds with secondary amine | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-13 | — | — | US | disclosed |
| US-5057618-A | Catalysts | HOECHST AKTIENGESELLSCHAFT (JP) | 1991-10-15 | — | — | US | disclosed |