SCHEMBL8857147

SCHEMBL8857147

C=CC(=O)C(O)CCN=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL195839 0.80
SCHEMBL27746107 0.78
SCHEMBL9487606 0.74
SCHEMBL6326047 0.72
SCHEMBL8857355 0.72
SCHEMBL2124922 0.70 TSHR (0.32)
SCHEMBL27670579 0.70
SCHEMBL32689755 0.69 TSHR (0.42)
SCHEMBL1850147 0.69 TSHR (0.32)
SCHEMBL9575274 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103503219-A Non-aqueous electrolyte solution for secondary cell, and non-aqueous electrolyte secondary cell SHOWA DENKO KK 2014-01-08 CN claimed
CN-102119146-A Method for inhibiting polymerization of ethylenically unsaturated carboxylic acid ester compound containing isocyanate group and method for producing ethylenically unsaturated carboxylic acid ester compound containing isocyanate group SHOWA DENKO KK 2011-07-06 CN claimed
CN-103080164-B Aqueous polyurethane resin dispersion and manufacture method thereof, with and use UBE INDUSTRIES, LTD. (JP) 2016-05-18 CN disclosed
CN-104144996-A MICRO-STRUCTURED OPTICALLY CLEAR ADHESIVES 3M INNOVATIVE PROPERTIES CO 2014-11-12 CN disclosed
CN-102834469-B Metal pigment composition ASAHI KASEI CHEMICALS CORP. (JP) 2014-10-29 CN disclosed
CN-104109502-A Photocuring composition for transparent bonding sheet, bonding sheet using same and use thereof SHOWA DENKO KK 2014-10-22 CN disclosed
CN-104080822-A Compound, polymer, curable composition, coating composition, article having cured film, article having pattern of lyophilic regions and lyophobic regions, and method for producing same ASAHI GLASS CO LTD 2014-10-01 CN disclosed
CN-102422224-B Photosensitive resin composition, dry film and cured product of same, and printed wiring board using these materials TAIYO HOLDINGS Co.,Ltd. (JP) 2014-10-01 CN disclosed
CN-102648091-B Transfer film, resin laminate, and method for producing same MITSUBISHI RAYON CO 2014-08-27 CN disclosed
CN-103998414-A Liquid-repellent compound, liquid-repellent polymer, curable composition, coating composition, article having cured film, article having pattern of lyophilic region and liquid-repellent region, and method for producing same ASAHI GLASS CO LTD 2014-08-20 CN disclosed
CN-103987803-A Production method for transparent double-sided adhesive sheet, and transparent double-sided adhesive sheet SHOWA DENKO KK 2014-08-13 CN disclosed
CN-101573827-A Dye-sensitized solar cell NITTO DENKO CORP (JP) 2009-11-04 CN disclosed
CN-101374886-A Curable composition containing thiol compound SHOWA DENKO KK (JP) 2009-02-25 CN disclosed
CN-101346407-A Macro-diacrylates and macro-polyacrylates MNEMOSCIENCE GMBH (DE) 2009-01-14 CN disclosed
CN-101331157-A Fluorine-containing polymer, negative photosensitive composition and partition wall ASAHI GLASS CO LTD (JP) 2008-12-24 CN disclosed
CN-101173127-A Ink set SEIKO EPSON CORP (JP) 2008-05-07 CN disclosed
EP-0523723-B1 Resin composition MITSUI TOATSU CHEMICALS (JP) 1997-11-05 EP disclosed
US-5633317-A Isocyanate resin compositions and hot melt and pressure sensitive adhesives based thereon MITSUI TOATSU CHEMICALS, INC. (JP) 1997-05-27 US disclosed
US-5418288-A Acrylic graft polymers with isocyanate group MITSUI TOATSU CHEMICALS, INC. (JP) 1995-05-23 US disclosed
EP-0523723-A1 Resin composition MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-20 EP disclosed