SCHEMBL8894529

SCHEMBL8894529

CCC(CC)[SiH2]C(C)(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2270675 0.64
SCHEMBL236029 0.61
SCHEMBL27540347 0.57
SCHEMBL9746130 0.57
SCHEMBL11852752 0.57
SCHEMBL1778511 0.57
SCHEMBL3266717 0.57
SCHEMBL16927197 0.57
SCHEMBL10707892 0.57
SCHEMBL6311006 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5637351-A LOW TEMPERATURE VACUUM DEPOSITION AIR PRODUCTS AND CHEMICALS, INC. (US) 1997-06-10 US disclosed
EP-0742290-A1 Chemical vapor deposition (CVD) of silicon dioxide films using oxygen-silicon source reactants and a free radical promoter AIR PRODUCTS AND CHEMICALS, INC. (US) 1996-11-13 EP disclosed
EP-0387403-B1 DEPOSITION OF SILICON OXIDE FILMS USING ALKYLSILANE LIQUID SOURCES AIR PRODUCTS AND CHEMICALS, INC. (US) 1993-10-06 EP disclosed
US-4981724-A OXIDATION, SEMICONDUCTORS VERSUM MATERIALS US, LLC 1991-01-01 US disclosed