SCHEMBL9746130

SCHEMBL9746130

CCC(CC)[SiH2]O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16044986 0.81
SCHEMBL3481430 0.76
SCHEMBL3481896 0.74 LMNA (0.41)
SCHEMBL3481930 0.72
SCHEMBL3482205 0.67 ALDH1A1 (0.40)
SCHEMBL4468422 0.67
SCHEMBL599022 0.65
SCHEMBL3266717 0.61
SCHEMBL1778511 0.61
SCHEMBL16927197 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9593192-B2 Method for producing modified polymer and hydrogenated product thereof JSR CORPORATION (JP) 2017-03-14 US claimed
EP-2789633-B1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR CORP (JP) 2016-05-25 EP claimed
EP-2789633-A1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR Corporation (JP) 2014-10-15 EP claimed
US-20140275422-A1 METHOD FOR PRODUCING MODIFIED POLYMER AND HYDROGENATED PRODUCT THEREOF JSR CORPORATION (JP) 2014-09-18 US claimed
CN-103958549-A Method for manufacturing modified polymer and hydrogen adduct thereof JSR CORP 2014-07-30 CN claimed
CN-118818897-A Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element JSR株式会社 2024-10-22 CN disclosed
CN-115268214-A Radiation-sensitive composition, cured film and method for producing the same, semiconductor and display device JSR株式会社 2022-11-01 CN disclosed
US-9593192-B2 Method for producing modified polymer and hydrogenated product thereof JSR CORPORATION (JP) 2017-03-14 US disclosed
EP-2789633-B1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR CORP (JP) 2016-05-25 EP disclosed
EP-2789633-A1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR Corporation (JP) 2014-10-15 EP disclosed
US-20140275422-A1 METHOD FOR PRODUCING MODIFIED POLYMER AND HYDROGENATED PRODUCT THEREOF JSR CORPORATION (JP) 2014-09-18 US disclosed
CN-103958549-A Method for manufacturing modified polymer and hydrogen adduct thereof JSR CORP 2014-07-30 CN disclosed
US-7846875-B2 Coupling agents comprising a photolabile protecting group and uses thereof, such as for the functionalisation of solid supports COMMISSARIAT A L 'ENERGIE ATOMIQUE (FR) 2010-12-07 US disclosed
US-20070298516-A1 Coupling Agents Comprising A Photolabile Protecting Group And Uses Thereof, Such As For The Functionalisation Of Solid Supports COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 2007-12-27 US disclosed
US-5100762-A Radiation-sensitive polymer and radiation-sensitive composition containing the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1992-03-31 US disclosed
EP-0278368-B1 A METHOD FOR PRODUCING CHLOROSILANES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1990-09-19 EP disclosed
US-4780556-A Method for producing chlorosilanes SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-10-25 US disclosed
EP-0278368-A1 A method for producing chlorosilanes SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-08-17 EP disclosed