SCHEMBL8897147

SCHEMBL8897147

c1ccc(Nc2ccccc2C2CCCCC2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.45
KDM4E B2RXH2 3/20 0.45
PDE5A O76074 1/20 0.45
GAA P10253 4/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
TDP1 Q9NUW8 3/20 0.44
GLA P06280 1/20 0.44
RECQL P46063 1/20 0.44
ALDH1A1 P00352 3/20 0.42
LMNA P02545 2/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
MAPK1 P28482 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
PTGDR2 Q9Y5Y4 1/20 0.41
NPY5R Q15761 2/20 0.40
HSD17B10 Q99714 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22646205 1.00 MAPT (0.45) MAPTKDM4EPDE5AGAAMEN1
SCHEMBL11636819 0.86 MAPT (0.49) MAPTGAAMEN1KMT2ATDP1
SCHEMBL15847169 0.86 MAPT (0.51) MAPTKDM4EPDE5AGAAMEN1
SCHEMBL25502788 0.83 PTGS2 (0.41) MAPTKDM4EPDE5AGAAMEN1
SCHEMBL29195988 0.82 HSD17B10 (0.40) MAPTKDM4EGAAPTGDR2HSD17B10
SCHEMBL11281757 0.80 CYP3A4 (0.42) MAPTKDM4EPDE5AGAAMEN1
SCHEMBL3963851 0.80 GAA (0.53) MAPTKDM4EPDE5AGAAMEN1
SCHEMBL29549893 0.79 MAPT (0.38) MAPTKDM4EPDE5AGAAMEN1
SCHEMBL22772434 0.79 MAPT (0.38) MAPTKDM4EPDE5AGAAMEN1
SCHEMBL16187336 0.79 MAPT (0.44) MAPTKDM4EPDE5AGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116925111-A Organic compound and application thereof 北京鼎材科技有限公司 2023-10-24 CN disclosed
EP-0602616-B1 Process for producing 4-nitrosodiphenylamines or their salts SUMITOMO CHEMICAL CO (JP) 1997-08-27 EP disclosed
US-5648543-A FROM DIPHENYLAMIE AND NITROGEN OXIDES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1997-07-15 US disclosed
EP-0602616-A1 Process for producing 4-nitrosodiphenylamines or their salts SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-06-22 EP disclosed