SCHEMBL889760

SCHEMBL889760

S=C1CCCS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9749365 0.65
SCHEMBL9381198 0.62
Thiobutyrolactone SCHEMBL13480 0.60
SCHEMBL72538 0.60
Thiobutyrolactone SCHEMBL1021969 0.60
SCHEMBL1456254 0.60
SCHEMBL123953 0.60
Ammonia Solution, Strong SCHEMBL20547687 0.58
Hydrochloric Acid SCHEMBL195302 0.58
SCHEMBL1935502 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11834703-B2 Hybridization compositions and methods AGILENT TECHNOLOGIES, INC. (US) 2023-12-05 US disclosed
US-11795499-B2 Compositions and methods for performing hybridizations with separate denaturation of the sample and probe AGILENT TECHNOLOGIES, INC. (US) 2023-10-24 US disclosed
US-11773059-B2 Onium salt, chemically amplified negative resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11773059-B2 Onium salt, chemically amplified negative resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11687000-B2 Sulfonium compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-27 US disclosed
US-11687000-B2 Sulfonium compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-27 US disclosed
US-20230134822-A1 AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-20230134822-A1 AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-20230137472-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-20230137472-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-20110318745-A1 COMPOSITIONS AND METHODS FOR PERFORMING HYBRIDIZATIONS WITH SEPARATE DENATURATION OF THE SAMPLE AND PROBE DAKO DENMARK APS (DK) 2011-12-29 US disclosed
US-20110311974-A1 COMPOSITIONS AND METHODS FOR PERFORMING A STRINGENT WASH STEP IN HYBRIDIZATION APPLICATIONS DAKO DENMARK APS (DK) 2011-12-22 US disclosed
US-20110306047-A1 Compositions and Methods for RNA Hybridization Applications DAKO DENMARK A/S (DK) 2011-12-15 US disclosed
US-20110281263-A1 Compositions and Methods for Detection of Chromosomal Aberrations with Novel Hybridization Buffers DAKO DENMARK APS (DK) 2011-11-17 US disclosed
US-20110229975-A1 Hybridization Compositions and Methods DAKO DENMARK APS (DK) 2011-09-22 US disclosed
US-20110112021-A1 PEGYLATED RECOMBINANT HUMAN GROWTH HORMONE COMPOUNDS ASCENDIS PHARMA AS (DK) 2011-05-12 US disclosed
WO-2005063018-A1 HALOALKENE COMPOUNDS, PROCESS FOR THEIR PRODUCTION AND PESTICIDES CONTAINING THEM ISHIHARA SANGYO KAISHA, LTD. (JP) 2005-07-14 WO disclosed
WO-2004052872-A1 HALOALKENE COMPOUNDS, PROCESS FOR THEIR PRODUCTION AND PESTICIDES CONTAINING THEM ISHIHARA SANGYO KAISHA, LTD. (JP) 2004-06-24 WO disclosed
US-5814629-A FUNGICIDES, BACTERICIDES AND VIRICIDES OF PLANTS NOVARTIS FINANCE CORPORATION (US) 1998-09-29 US disclosed
EP-0780394-A1 Microbicides Novartis AG (CH) 1997-06-25 EP disclosed