SCHEMBL890477

SCHEMBL890477

C(CCCCOCC1CO1)CCCCOCC1CO1

nearest known ligand 0.95

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.95
ALDH1A1 P00352 5/20 0.79
TDP1 Q9NUW8 2/20 0.79
SMN1; SMN2 Q16637 1/20 0.71
MAPK1 P28482 1/20 0.48
TP53 P04637 1/20 0.38
CYP3A4 P08684 1/20 0.38
SPHK2 Q9NRA0 4/20 0.37
SPHK1 Q9NYA1 4/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15084995 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL28763664 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL12805060 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL262589 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL262140 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL23668239 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL15215 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL21834095 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL20543294 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1
SCHEMBL2784183 1.00 TSHR (0.95) TSHRALDH1A1TDP1SMN1; SMN2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111849394-B Photocurable adhesive composition, photocurable adhesive, polarizing plate, and optical device 常州强力电子新材料股份有限公司 2021-12-28 CN claimed
CN-111849394-A Photocurable adhesive composition, photocurable adhesive, polarizing plate, and optical device 常州强力电子新材料股份有限公司 2020-10-30 CN claimed
CN-100427189-C Method for producing selective diffusion barrier with excellent pollution resistibility SAE HAN INDUSTRY CO LTD (KR) 2008-10-22 CN claimed
CN-1468649-A Method for producing selective diffusion barrier with excellent pollution resistibility 世韩工业株式会社 2004-01-21 CN claimed
US-20030121844-A1 Selective membrane having a high fouling resistance SAEHAN INDUSTRIES INCORPORATION (KR) 2003-07-03 US claimed
EP-3749723-B1 UV-CURABLE NON-ISOCYANATE POLYUREA POLYMER AND UV-CURABLE COATING COMPOSITION CONTAINING THE SAME GUANGDONG HUARUN PAINTS CO LTD (CN) 2024-11-27 EP disclosed
WO-2024141344-A1 MULTISTAGE POLYMER COMPOSITIONS AND COATINGS COMPRISING CURED MULTISTAGE POLYMER COMPOSITIONS ARKEMA FRANCE (FR) 2024-07-04 WO disclosed
EP-4393963-A1 METHODS FOR PREPARING MULTISTAGE POLYMER PARTICLE COMPOSITIONS AND CURABLE FORMULATIONS FOR THREE-DIMENSIONAL PRINTING ARKEMA FRANCE (FR) 2024-07-03 EP disclosed
EP-4393982-A1 MULTISTAGE POLYMER COMPOSITIONS AND COATINGS COMPRISING CURED MULTISTAGE POLYMER COMPOSITIONS ARKEMA FRANCE (FR) 2024-07-03 EP disclosed
EP-4393720-A1 PHOSPHINE OXIDE-BASED PHOTOINITIATORS ARKEMA FRANCE (FR) 2024-07-03 EP disclosed
WO-2024122572-A1 WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND 日産化学株式会社 2024-06-13 WO disclosed
CN-118159581-A Epoxy resin composition, cured product thereof, and laminate DIC株式会社 2024-06-07 CN disclosed
US-20120082853-A1 URETHANE RESIN, ACTINIC ENERGY RAY CURABLE ADHESIVE, AND BACK PROTECTIVE SHEET FOR SOLAR CELL TOYO INK SC HOLDINGS CO., LTD. (JP) 2012-04-05 US disclosed
EP-2373714-A1 LOW VOC AQUEOUS POLYMER DISPERSIONS The Sherwin-Williams Company (US) 2011-10-12 EP disclosed
WO-2010080620-A1 LOW VOC AQUEOUS POLYMER DISPERSIONS THE SHERWIN-WILLIAMS COMPANY (US) 2010-07-15 WO disclosed
US-20100160586-A1 Low VOC Aqueous Polymer Dispersions THE SHERWIN-WILLIAMS COMPANY (US) 2010-06-24 US disclosed
CN-100427189-C Method for producing selective diffusion barrier with excellent pollution resistibility SAE HAN INDUSTRY CO LTD (KR) 2008-10-22 CN disclosed
US-6913694-B2 Selective membrane having a high fouling resistance SAEHAN INDUSTRIES INCORPORATION (KR) 2005-07-05 US disclosed
CN-1468649-A Method for producing selective diffusion barrier with excellent pollution resistibility 世韩工业株式会社 2004-01-21 CN disclosed
US-20030121844-A1 Selective membrane having a high fouling resistance SAEHAN INDUSTRIES INCORPORATION (KR) 2003-07-03 US disclosed