SCHEMBL891265

SCHEMBL891265

CCC(S)C(S)(S)S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28553571 0.73
SCHEMBL1407498 0.73
SCHEMBL276628 0.71
SCHEMBL22471875 0.69
SCHEMBL14743096 0.69 DNM1 (0.38)
SCHEMBL6855644 0.69
SCHEMBL14198681 0.69
SCHEMBL1550835 0.69
SCHEMBL998846 0.67
SCHEMBL704442 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5310847-A Polymer compositions based on polythiourethanes for the manufacture of organic glasses ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 1994-05-10 US claimed
EP-0408459-B1 Polythiourethane-based polymer compositions suitable for the fabrication of organic glasses ESSILOR INT (FR) 1994-03-30 EP claimed
EP-0549391-A1 Ophthalmic lenses based on polyurethanes derived from polythiols ESSILOR INTERNATIONAL, Compagnie Générale d'Optique (FR) 1993-06-30 EP claimed
EP-0408459-A1 Polythiourethane-based polymer compositions suitable for the fabrication of organic glasses ESSILOR INTERNATIONAL Compagnie Générale d'Optique (FR) 1991-01-16 EP claimed
US-20240034930-A1 PATTERNING MATERIAL, PATTERNING COMPOSITION, AND PATTERN FORMING METHOD HUAWEI TECHNOLOGIES CO., LTD. (CN) 2024-02-01 US disclosed
EP-3480340-B1 IRON PARTICLE PASSIVATION BOEING CO (US) 2023-06-07 EP disclosed
CN-115697573-A Die head 富士胶片株式会社 2023-02-03 CN disclosed
WO-2022218315-A1 PATTERNING MATERIAL, PATTERNING COMPOSITION, AND PATTERN FORMING METHOD 华为技术有限公司 2022-10-20 WO disclosed
CN-113031395-A Colored photosensitive resin composition and black matrix prepared therefrom 罗门哈斯电子材料韩国有限公司 2021-06-25 CN disclosed
US-20210191259-A1 COLORED PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX PREPARED THEREFROM ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) 2021-06-24 US disclosed
US-10597543-B2 Method for repairing or reinforcing structure, method for producing repaired or reinforced structure, and adhesive sheet DAI NIPPON PRINTING CO., LTD. (JP) 2020-03-24 US disclosed
US-20170120547-A1 METHOD FOR REPAIRING OR REINFORCING STRUCTURE, METHOD FOR PRODUCING REPAIRED OR REINFORCED STRUCTURE AND ADHESIVE SHEET DAI NIPPON PRINTING CO., LTD. (JP) 2017-05-04 US disclosed
US-5352757-A Sulfur compounds and new polymers obtained from these sulfur compounds RHONE-POULENC CHIMIE (FR) 1994-10-04 US disclosed
US-5310847-A Polymer compositions based on polythiourethanes for the manufacture of organic glasses ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 1994-05-10 US disclosed
EP-0408459-B1 Polythiourethane-based polymer compositions suitable for the fabrication of organic glasses ESSILOR INT (FR) 1994-03-30 EP disclosed
EP-0549391-A1 Ophthalmic lenses based on polyurethanes derived from polythiols ESSILOR INTERNATIONAL, Compagnie Générale d'Optique (FR) 1993-06-30 EP disclosed
WO-1992010472-A2 NEW SULPHUROUS COMPOUNDS AND NEW POLYMERS OBTAINED THEREFROM RHONE-POULENC CHIMIE (FR) 1992-06-25 WO disclosed
EP-0490777-A1 Sulphur compounds and polymers obtained therefrom RHONE-POULENC CHIMIE (FR) 1992-06-17 EP disclosed
EP-0490778-A1 Sulphur compounds and polymers obtained therefrom RHONE-POULENC CHIMIE (FR) 1992-06-17 EP disclosed
EP-0408459-A1 Polythiourethane-based polymer compositions suitable for the fabrication of organic glasses ESSILOR INTERNATIONAL Compagnie Générale d'Optique (FR) 1991-01-16 EP disclosed