Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25834840 | 0.67 | CA1 (0.38) | CA1CA2CA9 | |
| SCHEMBL809377 | 0.67 | CA1 (0.38) | CA1CA2CA9 | |
| SCHEMBL13345238 | 0.65 | — | — | |
| SCHEMBL6548087 | 0.64 | CA1 (0.36) | CA1CA2CA9 | |
| SCHEMBL9124188 | 0.64 | CA1 (0.36) | CA1CA2CA9 | |
| SCHEMBL719545 | 0.62 | CA1 (0.36) | CA1CA2CA9 | |
| SCHEMBL15824292 | 0.62 | CA1 (0.36) | CA1CA2CA9 | |
| SCHEMBL7642792 | 0.62 | CA1 (0.31) | CA1CA2CA9 | |
| SCHEMBL14814855 | 0.62 | ABHD6 (0.35) | CA1CA2CA9 | |
| SCHEMBL4957039 | 0.62 | CA1 (0.31) | CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0350009-B1 | Photochromic compound and photochromic composition | KUREHA CHEMICAL IND CO LTD (JP) | 1997-10-08 | — | — | EP | claimed |
| CN-103068797-B | Hexafluoroisopropyl carbamate derivatives, their preparation and their therapeutic application | SANOFI SA | 2015-03-11 | — | — | CN | disclosed |
| CN-103068797-A | Hexafluoroisopropyl carbamate derivatives, their preparation and their therapeutic application | SANOFI SA | 2013-04-24 | — | — | CN | disclosed |
| WO-2012086850-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-28 | — | — | WO | disclosed |