SCHEMBL8917596

SCHEMBL8917596

C=C(C)C(=O)OCCN(CC)C(=O)OCC

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.51
TSHR P16473 4/20 0.46
ALDH1A1 P00352 6/20 0.34
LMNA P02545 2/20 0.33
HSD17B10 Q99714 1/20 0.33
POLB P06746 1/20 0.33
APEX1 P27695 1/20 0.33
HTT P42858 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
MGAM O43451 1/20 0.32
GAA P10253 1/20 0.32
SI P14410 1/20 0.32
MGAM2 Q2M2H8 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM5 P08912 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRNB2 P17787 1/20 0.32
CHRM3 P20309 1/20 0.32
CHRNA4 P43681 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29691692 0.92 THRB (0.53) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL29691691 0.89 THRB (0.50) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL2474534 0.86 TSHR (0.54) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL27707440 0.84 THRB (0.52) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL14999293 0.83 THRB (0.47) THRBTSHRALDH1A1LMNAPOLB
SCHEMBL4916565 0.83 THRB (0.51) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL1327708 0.83 THRB (0.50) THRBTSHRALDH1A1LMNAPOLB
SCHEMBL14999216 0.82 THRB (0.58) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL4981730 0.81 THRB (0.49) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL8146726 0.81 THRB (0.49) THRBTSHRALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5614354-A Method of forming positive polyimide patterns TORAY INDUSTRIES, INC. (JP) 1997-03-25 US disclosed
EP-0634698-A1 PROCESS FOR FORMING POSITIVE POLYIMIDE PATTERN TORAY INDUSTRIES, INC. (JP) 1995-01-18 EP disclosed