Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.31 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.31 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.31 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.31 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.31 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.31 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25304511 | 0.88 | MEN1 (0.33) | MEN1KMT2AHSD11B1 | |
| SCHEMBL2356470 | 0.86 | MEN1 (0.42) | MEN1KMT2AHSD11B1GRIN2DGRIN3B | |
| SCHEMBL892472 | 0.84 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL3612425 | 0.84 | GRIN2D (0.36) | MEN1KMT2AGRIN2DGRIN3BGRIN1 | |
| SCHEMBL11201357 | 0.82 | MEN1 (0.40) | MEN1KMT2AGRIN2DGRIN3BGRIN1 | |
| SCHEMBL4819390 | 0.82 | MEN1 (0.40) | MEN1KMT2AGRIN2DGRIN3BGRIN1 | |
| SCHEMBL11196399 | 0.82 | MEN1 (0.40) | MEN1KMT2AGRIN2DGRIN3BGRIN1 | |
| Hydrogen Peroxide SCHEMBL28045737 | 0.82 | MEN1 (0.40) | MEN1KMT2AGRIN2DGRIN3BGRIN1 | |
| SCHEMBL65160 | 0.79 | — | — | |
| SCHEMBL7814996 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240376323-A1 | ADHESION LAYER-APPLIED SUBSTRATE, LAMINATE, AND COATING MATERIAL COMPOSITION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-11-14 | — | — | US | disclosed |
| EP-4353758-A1 | RESIN COMPOSITION, COATING MATERIAL, AND COATED ARTICLE | DIC Corporation (JP) | 2024-04-17 | — | — | EP | disclosed |
| US-11781037-B2 | High-durability antifogging coating film and coating composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-10-10 | — | — | US | disclosed |
| WO-2023132373-A1 | AQUEOUS DISPERSION, COATING COMPOSITION, COATING FILM AND COATED ARTICLE | ダイキン工業株式会社 | 2023-07-13 | — | — | WO | disclosed |
| US-20230086403-A1 | LAMINATE, HARD COATING FILM, AND COATING MATERIAL COMPOSITION | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-03-23 | — | — | US | disclosed |
| EP-4116085-A1 | LAMINATE, HARD-COAT COATING FILM, AND COATING MATERIAL COMPOSITION | Asahi Kasei Kabushiki Kaisha (JP) | 2023-01-11 | — | — | EP | disclosed |
| US-9312127-B2 | Method for producing semiconductor apparatus substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20160064220-A1 | METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9261783-B2 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-7485408-B2 | Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-20070218402-A1 | Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-20 | — | — | US | disclosed |
| EP-1616854-B1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| EP-1741705-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-20060093960-A1 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-05-04 | — | — | US | disclosed |
| EP-1652844-A2 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-05-03 | — | — | EP | disclosed |
| EP-1616854-A1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-18 | — | — | EP | disclosed |
| US-20060009602-A1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-01-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060009602-A1 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | HRH3, SUV39H2, SUV39H1 | MEN1 407/4885KMT2A 113/4885HSD11B1 1082/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.