Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.42 |
| ▸ | ATM | Q13315 | 1/20 | 0.42 |
| ▸ | CMA1 | P23946 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5768129 | 0.89 | MAPT (0.47) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| SCHEMBL1134704 | 0.85 | CYP3A4 (0.48) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| SCHEMBL18873211 | 0.82 | CYP3A4 (0.41) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| SCHEMBL1751672 | 0.79 | AHR (0.53) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| SCHEMBL2268770 | 0.79 | CYP3A4 (0.56) | ABCG2CYP3A4ALDH1A1MAPK1MAPT | |
| SCHEMBL1742802 | 0.79 | CYP3A4 (0.44) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| SCHEMBL30787730 | 0.79 | AHR (0.53) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| SCHEMBL16472556 | 0.79 | CYP3A4 (0.44) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| SCHEMBL29415600 | 0.79 | MAPT (0.56) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 | |
| Water SCHEMBL28525395 | 0.77 | MAPT (0.54) | ABCG2CYP3A4ALDH1A1HSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11524516-B2 | Security ink system | GLEITSMANN SECURITY INKS GMBH (DE) | 2022-12-13 | — | — | US | claimed |
| EP-3774378-B1 | SECURITY INK SYSTEM | GLEITSMANN SECURITY INKS GMBH (DE) | 2022-02-23 | — | — | EP | claimed |
| EP-3774378-A1 | SECURITY INK SYSTEM | Gleitsmann Security Inks GmbH (DE) | 2021-02-17 | — | — | EP | claimed |
| US-20200316982-A1 | SECURITY INK SYSTEM | GLEITSMANN SECURITY INKS GMBH (DE) | 2020-10-08 | — | — | US | claimed |
| WO-2020030413-A1 | SECURITY INK SYSTEM | GLEITSMANN SECURITY INKS GMBH (DE) | 2020-02-13 | — | — | WO | claimed |
| EP-3608120-A1 | SECURITY INK SYSTEM | Gleitsmann Security Inks GmbH (DE) | 2020-02-12 | — | — | EP | claimed |
| EP-4596562-A1 | COMPOUND, METAL COMPLEX, CATALYST COMPOSITION FOR OLEFIN POLYMERIZATION, CATALYST FOR OLEFIN POLYMERIZATION AND METHOD FOR PRODUCING OLEFIN POLYMER | Mitsubishi Chemical Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| WO-2024071415-A1 | COMPOUND, METAL COMPLEX, CATALYST COMPOSITION FOR OLEFIN POLYMERIZATION, CATALYST FOR OLEFIN POLYMERIZATION AND METHOD FOR PRODUCING OLEFIN POLYMER | 日本ポリケム株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-11829036-B2 | Optically anisotropic multilayer product and method for producing same | ZEON CORPORATION (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11829036-B2 | Optically anisotropic multilayer product and method for producing same | ZEON CORPORATION (JP) | 2023-11-28 | — | — | US | disclosed |
| EP-3668948-B1 | POLYMERISABLE LIQUID CRYSTAL MATERIAL AND POLYMERISED LIQUID CRYSTAL FILM | MERCK PATENT GMBH (DE) | 2023-10-25 | — | — | EP | disclosed |
| EP-3668947-B1 | POLYMERISABLE LC MEDIUM AND POLYMER FILM WITH FLAT OPTICAL DISPERSION | MERCK PATENT GMBH (DE) | 2023-09-27 | — | — | EP | disclosed |
| US-11524516-B2 | Security ink system | GLEITSMANN SECURITY INKS GMBH (DE) | 2022-12-13 | — | — | US | disclosed |
| US-8268530-B2 | Positive resist composition, method of forming resist pattern, polymeric compound, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20100273106-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100273106-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |
| US-5599522-A | CONTRAST ENHANCING AGENTS | NYCOMED IMAGING AS (NO) | 1997-02-04 | — | — | US | disclosed |
| EP-0515458-B1 | TRIARYLMETHYL RADICALS AND THE USE OF INERT CARBON FREE RADICALS IN MRI | NYCOMED INNOVATION AB (SE) | 1995-08-23 | — | — | EP | disclosed |
| EP-0515458-A1 | TRIARYLMETHYL RADICALS AND THE USE OF INERT CARBON FREE RADICALS IN MRI. | HAFSLUND NYCOMED INNOVATION (SE) | 1992-12-02 | — | — | EP | disclosed |
| WO-1991012024-A1 | TRIARYLMETHYL RADICALS AND THE USE OF INERT CARBON FREE RADICALS IN MRI | HAFSLUND NYCOMED INNOVATION AB (SE) | 1991-08-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100273106-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | RDX, DAD1, DDX1 | ABCG2 478/4885CYP3A4 4136/4885ALDH1A1 1632/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.