Ether

Ether

SCHEMBL8945933

CC(C)(C)c1ccc(C(=O)C(=O)c2ccccc2)cc1.CCOCC

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.53
TDP1 Q9NUW8 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
CES2 O00748 6/20 0.50
CES1 P23141 6/20 0.50
RAB9A P51151 4/20 0.50
LMNA P02545 1/20 0.50
TNF P01375 1/20 0.50
KLF5 Q13887 1/20 0.50
NOD1 Q9Y239 1/20 0.50
KCNK9 Q9NPC2 1/20 0.49
NPC1 O15118 3/20 0.48
POLB P06746 1/20 0.48
CASP3 P42574 1/20 0.48
SENP7 Q9BQF6 1/20 0.48
ESRRG P62508 2/20 0.48
ALDH1A1 P00352 2/20 0.48
RECQL P46063 1/20 0.48
SRD5A2 P31213 1/20 0.47
HPGD P15428 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14947050 0.88 CES2 (0.65) MAPTTDP1L3MBTL1CES2CES1
Water SCHEMBL8945938 0.86 CES2 (0.62) MAPTTDP1L3MBTL1CES2CES1
Benzil SCHEMBL2684477 0.86 CES2 (0.64) MAPTCES2CES1RAB9ALMNA
Benzil SCHEMBL2120600 0.80 CES2 (0.56) MAPTCES2CES1RAB9ALMNA
Tert-Butylbenzene SCHEMBL27920928 0.80 MAPK1 (0.46) MAPTTDP1L3MBTL1RAB9ALMNA
SCHEMBL2853873 0.80 HDAC1 (0.64) MAPTTDP1CES2CES1RAB9A
Benzil SCHEMBL8062113 0.79 CES2 (0.67) MAPTCES2CES1RAB9ALMNA
SCHEMBL4190159 0.77 KCNK9 (0.56) MAPTTDP1L3MBTL1CES2CES1
SCHEMBL195282 0.76 SRD5A2 (0.77) MAPTTDP1L3MBTL1RAB9ALMNA
Benzoic Acid SCHEMBL9155688 0.76 SRD5A2 (0.77) MAPTTDP1L3MBTL1CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5580702-A COMPRISING A PHOTOSENSITIVE ACID-GENERATING COMPOUND AND A COPOLYMER OF P-HYDROXYSTYRENE AND AN ESTER OF P-CARBOXYMETHOXYSTYRENE; NONTOXIC; STEEP WALLS; HIGH SPEED; SEMICONDUCTORS KABUSHIKI KAISHA TOSHIBA (JP) 1996-12-03 US disclosed
US-5403695-A Photolithography; high resolution; semiconductors KABUSHIKI KAISHA TOSHIBA (JP) 1995-04-04 US disclosed