SCHEMBL8947503

SCHEMBL8947503

CCN(CC)CCc1ccccc1C(=O)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SCN1A P35498 3/20 0.52
SCN2A Q99250 3/20 0.52
SCN3A Q9NY46 3/20 0.52
ABCB1 P08183 2/20 0.48
CYP19A1 P11511 1/20 0.46
ACHE P22303 1/20 0.45
ALDH1A1 P00352 3/20 0.45
HPGD P15428 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
AKR1C3 P42330 1/20 0.44
PKM P14618 1/20 0.44
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
KDM4E B2RXH2 2/20 0.43
LMNA P02545 1/20 0.43
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2398894 0.85 FOLH1 (0.56) SCN1ASCN2ASCN3AALDH1A1HPGD
Hydrochloric Acid SCHEMBL11581395 0.84 SCN1A (0.55) SCN1ASCN2ASCN3AALDH1A1HPGD
SCHEMBL7252078 0.82 AKR1C3 (0.52) ABCB1CYP19A1ALDH1A1HPGDAKR1C3
SCHEMBL28423359 0.81 AKR1C3 (0.59) CYP19A1ALDH1A1TDP1AKR1C3PKM
SCHEMBL542238 0.81 SCN1A (0.51) SCN1ASCN2ASCN3AALDH1A1HPGD
SCHEMBL723171 0.79 AKR1C3 (0.57) CYP19A1ALDH1A1HPGDAKR1C3KMT2A
SCHEMBL29881091 0.79 AKR1C3 (0.57) CYP19A1ALDH1A1HPGDAKR1C3KMT2A
SCHEMBL7164776 0.79 AKR1C3 (0.48) CYP19A1ALDH1A1AKR1C3GAAMAPT
SCHEMBL3837090 0.79 ACHE (0.41) SCN1ASCN2ASCN3AABCB1ACHE
SCHEMBL9559975 0.78 AKR1C3 (0.52) CYP19A1ALDH1A1HPGDTDP1AKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5550002-A EXPOSING TO LIGHT PHOTOHARDENABLE PHOTOSENSITIVE LAYER ON LIGHT-SENSITIVE PLATE, APPLYING HEAT OR PRESSURE, REMOVING EXPOSED LAYER, EXPOSING UNEXPOSED LAYER TO HARDEN KONICA CORPORATION (JP) 1996-08-27 US disclosed
US-4684601-A UNSATURATED, HIGH MOLECULAR WEIGHT DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-08-04 US disclosed
US-4640887-A C,M UNSATURATED POLYESTERS WITH FREE CARBOXY GROUPS; PRINTING DURABLE PLATES WITH IMPROVED OLEOPHILICITY DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-02-03 US disclosed
US-4591545-A Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender DAINIPPON INK AND CHEMICALS, INC. (JP) 1986-05-27 US disclosed
EP-0071236-B1 PHOTOSENSITIVE LITHOGRAPHIC PLATE MITSUBISHI KASEI CORPORATION (JP) 1986-04-23 EP disclosed
US-4421841-A UNSATURATED POLYESTERS MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1983-12-20 US disclosed
EP-0071236-A1 Photosensitive lithographic plate MITSUBISHI KASEI CORPORATION (JP) 1983-02-09 EP disclosed
EP-0009223-B1 PHOTOSENSITIVE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1982-11-10 EP disclosed
US-4258124-A Photosensitive composition MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1981-03-24 US disclosed
EP-0009223-A2 Photosensitive composition MITSUBISHI KASEI CORPORATION (JP) 1980-04-02 EP disclosed