SCHEMBL8949235

SCHEMBL8949235

CCCCC(CC)COC(=O)CCN(CCCCCCN(CCC(=O)OCC(CC)CCCC)C1CC(C)(C)NC(C)(C)C1)C1CC(C)(C)NC(C)(C)C1

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.51
TSHR P16473 2/20 0.51
ATM Q13315 1/20 0.51
TDP1 Q9NUW8 1/20 0.51
RECQL P46063 1/20 0.40
ALDH1A1 P00352 4/20 0.37
LMNA P02545 2/20 0.37
CA2 P00918 2/20 0.36
HSD17B10 Q99714 1/20 0.35
PRSS1 P07477 1/20 0.35
PRSS2 P07478 1/20 0.35
PRSS3 P35030 1/20 0.35
LPAR3 Q9UBY5 5/20 0.34
LPAR1 Q92633 3/20 0.34
ENPP2 Q13822 3/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
MAPK1 P28482 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
LPAR2 Q9HBW0 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8532522 0.83 EPHX2 (0.40) PRSS1PRSS2PRSS3
SCHEMBL8534785 0.77 LMNA (0.40) ALDH1A1LMNA
SCHEMBL9942321 0.73 CYP3A4 (0.66) CYP3A4TSHRATMTDP1RECQL
SCHEMBL15015605 0.72 CYP3A4 (0.73) CYP3A4TSHRATMTDP1RECQL
SCHEMBL11668677 0.72 CYP3A4 (0.73) CYP3A4TSHRATMTDP1RECQL
SCHEMBL10493410 0.72 TSHR (0.96) CYP3A4TSHRATMTDP1RECQL
SCHEMBL2049701 0.72 TSHR (0.96) CYP3A4TSHRATMTDP1RECQL
SCHEMBL14779242 0.72 TSHR (0.96) CYP3A4TSHRATMTDP1RECQL
SCHEMBL14778030 0.72 TSHR (0.96) CYP3A4TSHRATMTDP1RECQL
SCHEMBL37169 0.72 TSHR (0.96) CYP3A4TSHRATMTDP1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5506286-A BLENDING STABILZER WITH SYNTHETIC RESINS, RUBBERS, PAINTS, OILS TO STABILIZE FROM PHOTOOXIDATION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1996-04-09 US disclosed
US-5384348-A Improved photostability for polymers, weather resistance SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-01-24 US disclosed