⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9404362 | 0.75 | — | — | |
| SCHEMBL1484178 | 0.71 | — | — | |
| SCHEMBL14247237 | 0.71 | — | — | |
| SCHEMBL29599106 | 0.70 | — | — | |
| SCHEMBL29599867 | 0.64 | — | — | |
| SCHEMBL8949263 | 0.64 | — | — | |
| SCHEMBL29048323 | 0.60 | — | — | |
| SCHEMBL31453898 | 0.58 | — | — | |
| SCHEMBL29048313 | 0.58 | — | — | |
| SCHEMBL16272591 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5565529-A | GRAFT POLYMERIZATION A METALLACYCLOBUTANE POLYSILOXANE OR ORGANOMETALLIC POLYMER WITH A POLYIMIDE, THERMAL CROSSLINKING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-10-15 | — | — | US | claimed |
| EP-0403817-B1 | Dielectric structures with material resistant to etching and method of fabrication thereof | IBM (US) | 1995-12-06 | — | — | EP | claimed |
| US-5141817-A | Organosilicon, organogermanium polymer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1992-08-25 | — | — | US | claimed |
| EP-0403817-A2 | Dielectric structures with material resistant to etching and method of fabrication thereof | International Business Machines Corporation (US) | 1990-12-27 | — | — | EP | claimed |
| EP-4232504-B1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2024-11-06 | — | — | EP | disclosed |
| US-11866554-B2 | Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same | MERCK PATENT GMBH (DE) | 2024-01-09 | — | — | US | disclosed |
| US-20230303775-A1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-09-28 | — | — | US | disclosed |
| EP-4232504-A1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | Merck Patent GmbH (DE) | 2023-08-30 | — | — | EP | disclosed |
| CN-116547356-A | Polycarbosilazane, composition containing same, and method for producing silicon-containing film using same | 默克专利有限公司 | 2023-08-04 | — | — | CN | disclosed |
| WO-2022084022-A1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2022-04-28 | — | — | WO | disclosed |
| US-5565529-A | GRAFT POLYMERIZATION A METALLACYCLOBUTANE POLYSILOXANE OR ORGANOMETALLIC POLYMER WITH A POLYIMIDE, THERMAL CROSSLINKING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-10-15 | — | — | US | disclosed |
| EP-0403817-B1 | Dielectric structures with material resistant to etching and method of fabrication thereof | IBM (US) | 1995-12-06 | — | — | EP | disclosed |
| US-5141817-A | Organosilicon, organogermanium polymer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1992-08-25 | — | — | US | disclosed |
| EP-0403817-A2 | Dielectric structures with material resistant to etching and method of fabrication thereof | International Business Machines Corporation (US) | 1990-12-27 | — | — | EP | disclosed |