SCHEMBL8949855

SCHEMBL8949855

CC(=O)Oc1ccc(C)c(O)c1OC(C)=O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 2/20 0.53
HTT P42858 2/20 0.49
MAPK1 P28482 1/20 0.47
ACHE P22303 1/20 0.46
KDM4E B2RXH2 4/20 0.45
GAA P10253 3/20 0.45
HSD17B10 Q99714 2/20 0.45
MAPT P10636 2/20 0.45
TP53 P04637 1/20 0.45
PREP P48147 2/20 0.44
CELA1 Q9UNI1 1/20 0.44
ALDH1A1 P00352 3/20 0.43
HPGD P15428 1/20 0.43
POLB P06746 2/20 0.42
PIM1 P11309 1/20 0.42
TSHR P16473 1/20 0.42
RAB9A P51151 1/20 0.42
ELANE P08246 1/20 0.41
KMT2A Q03164 2/20 0.41
CFD P00746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9328943 0.86 PTPN1 (0.62) PTPN1HTTMAPK1ACHEKDM4E
SCHEMBL8022610 0.85 HTT (0.49) PTPN1HTTMAPK1ACHEKDM4E
SCHEMBL7565582 0.84 PTPN1 (0.51) PTPN1HTTMAPK1ACHEKDM4E
SCHEMBL7390252 0.82 ACHE (0.47) PTPN1HTTACHEKDM4EGAA
SCHEMBL6269458 0.82 PTPN1 (0.57) PTPN1HTTMAPK1ACHEKDM4E
Acetic Acid SCHEMBL7565584 0.81 KDM4E (0.49) PTPN1HTTMAPK1ACHEKDM4E
SCHEMBL7947809 0.78 POLB (0.51) PTPN1HTTMAPK1ACHEKDM4E
SCHEMBL10546986 0.78 MAPK1 (0.52) PTPN1HTTMAPK1ACHEKDM4E
SCHEMBL8949861 0.77 PIM1 (0.50) PTPN1HTTMAPK1ACHEKDM4E
SCHEMBL31268722 0.77 PIM1 (0.50) PTPN1HTTMAPK1ACHEKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5547812-A Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-08-20 US claimed
US-5547812-A Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-08-20 US disclosed