Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.47 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 4/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.43 |
| ▸ | TTR | P02766 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL215343 | 0.87 | TDP1 (0.46) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL18138425 | 0.85 | TDP1 (0.45) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL5964869 | 0.84 | KDM4E (0.44) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL5964706 | 0.84 | TDP1 (0.44) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL1882600 | 0.84 | TDP1 (0.47) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL11748681 | 0.84 | KDM4E (0.44) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL4101467 | 0.83 | ALDH1A1 (0.51) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL29787159 | 0.81 | TRPV1 (0.44) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL16033385 | 0.81 | ALDH1A1 (0.42) | KDM4EPOLBTDP1L3MBTL1CTDSP1 | |
| SCHEMBL5373510 | 0.81 | KDM4E (0.45) | KDM4EPOLBTDP1L3MBTL1CTDSP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113979895-B | Self-degradable polymer with controllable precise sequence and preparation method and application thereof | 中国科学技术大学 | 2023-03-24 | — | — | CN | disclosed |
| CN-113979895-A | Self-degradable polymer with controllable precise sequence and preparation method and application thereof | 中国科学技术大学 | 2022-01-28 | — | — | CN | disclosed |
| US-9546364-B2 | Synthetic lariat RNA for RNA interference | CARNEGIE MELLON UNIVERSITY (US) | 2017-01-17 | — | — | US | disclosed |
| US-20140273216-A1 | Synthetic Lariat RNA for RNA Interference | Camegie Mellon University (US) | 2014-09-18 | — | — | US | disclosed |
| US-5508141-A | AQUEOUS ACIDIC PHOTORESIST EMULSION CONTAINING RESIN, POSITIVE-ACTING PHOTOACTIVE FUNCTIONALITY, ACID, OXIDIZING AGENT, SURFACTANT | W. R. GRACE & CO.-CONN. (US) | 1996-04-16 | — | — | US | disclosed |
| CN-1030739-C | Method for selectively coating metal surface, method for forming circuit pattern from metal surface and photosensitive emulsion used therefor | GRACE W R & CO (US) | 1996-01-17 | — | — | CN | disclosed |
| EP-0468002-A4 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | GRACE W R & CO (US) | 1995-08-09 | — | — | EP | disclosed |
| US-5232815-A | Corrosion resistance | W. R. GRACE & CO.-CONN. (US) | 1993-08-03 | — | — | US | disclosed |
| EP-0518453-A1 | A method of making electrical circuit traces | W.R. Grace & Co.-Conn. (US) | 1992-12-16 | — | — | EP | disclosed |
| EP-0468002-A1 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | W.R. GRACE & CO.-CONN. (US) | 1992-01-29 | — | — | EP | disclosed |
| CN-1054836-A | Automatic deposition emulsion and the method for the metal surface being carried out selective protection with this emulsion | GRACE W R & CO (US) | 1991-09-25 | — | — | CN | disclosed |
| WO-1991008840-A1 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | W.R. GRACE & CO.-CONN. (US) | 1991-06-27 | — | — | WO | disclosed |
| CN-1036276-A | Make the method for erect image and negative-appearing image with the static main leaf of photo-hardening | DU PONT (US) | 1989-10-11 | — | — | CN | disclosed |
| US-4859551-A | Process for preparing positive and negative images using photohardenable electrostatic master | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-08-22 | — | — | US | disclosed |
| EP-0315121-A2 | Process for preparing positive and negative images using photohardenable electrostatic master | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-05-10 | — | — | EP | disclosed |
| US-4632900-A | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface | CIBA-GEIGY CORPORATION (US) | 1986-12-30 | — | — | US | disclosed |
| US-4269933-A | PHOTOLITHOGRAPHY; POSITIVE AND NEGATIVE IMAGES; POLYMERIZATION OF A UNSATURATED POLYESTER USING A PHOTOSENSITIVE FREE RADICAL SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-05-26 | — | — | US | disclosed |
| US-4198242-A | Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1980-04-15 | — | — | US | disclosed |