⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11169285 | 0.96 | — | — | |
| SCHEMBL443045 | 0.71 | — | — | |
| SCHEMBL829504 | 0.67 | — | — | |
| SCHEMBL1818889 | 0.64 | — | — | |
| SCHEMBL7970718 | 0.63 | — | — | |
| SCHEMBL1820979 | 0.62 | — | — | |
| SCHEMBL4184176 | 0.61 | — | — | |
| SCHEMBL1821282 | 0.60 | — | — | |
| SCHEMBL459387 | 0.59 | — | — | |
| SCHEMBL14656540 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9230821-B2 | Dry etching agent and dry etching method using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | claimed |
| US-9093388-B2 | Dry etching agent and dry etching method using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-28 | — | — | US | claimed |
| US-20120298911-A1 | Dry Etching Agent and Dry Etching Method Using the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-11-29 | — | — | US | claimed |
| EP-2511948-A1 | DRY ETCHING AGENT AND DRY ETCHING METHOD USING THE SAME | Central Glass Company, Limited (JP) | 2012-10-17 | — | — | EP | claimed |
| CN-102741987-A | Dry etching agent and dry etching method using the same | CENTRAL GLASS CO LTD | 2012-10-17 | — | — | CN | claimed |
| CN-114410631-A | Construction method and application of efficient synthesis of cembratriene-alcohol strain | 江南大学 | 2022-04-29 | — | — | CN | disclosed |
| CN-114277040-A | Construction method and application of bacterial strain for efficiently synthesizing beta-carotene | 江南大学 | 2022-04-05 | — | — | CN | disclosed |
| US-11114305-B2 | Etching method and semiconductor manufacturing method | SHOWA DENKO K.K. (JP) | 2021-09-07 | — | — | US | disclosed |
| US-20210217627-A1 | ETCHING METHOD AND SEMICONDUCTOR MANUFACTURING METHOD | SHOWA DENKO K.K. (JP) | 2021-07-15 | — | — | US | disclosed |
| EP-3706158-A1 | ETCHING METHOD AND SEMICONDUCTOR MANUFACTURING METHOD | Showa Denko K.K. (JP) | 2020-09-09 | — | — | EP | disclosed |
| CN-111213224-A | Etching method and semiconductor manufacturing method | 昭和电工株式会社 | 2020-05-29 | — | — | CN | disclosed |
| US-9230821-B2 | Dry etching agent and dry etching method using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20120298911-A1 | Dry Etching Agent and Dry Etching Method Using the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-11-29 | — | — | US | disclosed |
| EP-2511948-A1 | DRY ETCHING AGENT AND DRY ETCHING METHOD USING THE SAME | Central Glass Company, Limited (JP) | 2012-10-17 | — | — | EP | disclosed |
| CN-102741987-A | Dry etching agent and dry etching method using the same | CENTRAL GLASS CO LTD | 2012-10-17 | — | — | CN | disclosed |
| US-5496848-A | Process for the preparation of substituted difluorobenzo-1,3-dioxoles | CIBA-GEIGY CORPORATION (US) | 1996-03-05 | — | — | US | disclosed |
| US-5493032-A | INSECTICIDES, MICROBIOCIDES | CIBA-GEIGY CORPORATION (US) | 1996-02-20 | — | — | US | disclosed |
| US-5420301-A | Process for the preparation of substituted difluorobenzo-1,3-dioxoles | CIBA-GEIGY CORPORATION (US) | 1995-05-30 | — | — | US | disclosed |
| US-5281718-A | Reacting in one pot reaction 2,2-difluorobenzodioxole with an organometal compound or metal to form 4-metallo-2,2-difluorobenzodioxole, reacting with unsaturated nitrile, then with isocyanide | CIBA-GEIGY CORPORATION (US) | 1994-01-25 | — | — | US | disclosed |
| US-5194628-A | Reacting metallo-difluorobenzodioxole with unsaturated nitrile and then with sulfonylmethyl isocyanide | CIBA-GEIGY CORPORATION (US) | 1993-03-16 | — | — | US | disclosed |