SCHEMBL895498

SCHEMBL895498

CC(C)C(F)CF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL29064853 0.79 SLC7A5 (0.33)
SCHEMBL727227 0.77
SCHEMBL21696350 0.77
Ammonia Solution, Strong SCHEMBL9616239 0.74
SCHEMBL8916556 0.74
SCHEMBL1470791 0.74
SCHEMBL18666201 0.74
SCHEMBL22301675 0.72 ALDH1A1 (0.31)
SCHEMBL24180738 0.72
SCHEMBL19514066 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12024533-B2 Antimicrobial organosilanes TOPIKOS SCIENTIFIC, INC. (US) 2024-07-02 US disclosed
US-20240072809-A1 ASGPR-BINDING COMPOUNDS FOR THE DEGRADATION OF EXTRACELLULAR PROTEINS AVILAR THERAPEUTICS, INC. (US) 2024-02-29 US disclosed
US-11819551-B2 ASGPR-binding compounds for the degradation of extracellular proteins AVILAR THERAPEUTICS, INC. (US) 2023-11-21 US disclosed
US-20230265096-A1 APOL1 INHIBITORS AND METHODS OF USE HERCULES CAPITAL, INC., AS AGENT 2023-08-24 US disclosed
US-20230265096-A1 APOL1 INHIBITORS AND METHODS OF USE HERCULES CAPITAL, INC., AS AGENT 2023-08-24 US disclosed
US-20230143708-A1 ANTIMICROBIAL ORGANOSILANES TOPIKOS PHARMACEUTICALS, INC. (US) 2023-05-11 US disclosed
US-20230022157-A1 PHARMACEUTICAL COMPOUNDS FOR THE TREATMENT OF COMPLEMENT FACTOR D MEDICAL DISORDERS ACHILLION PHARMACEUTICALS, INC. (US) 2023-01-26 US disclosed
US-10651286-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2020-05-12 US disclosed
US-20190305109-A1 HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION 2019-10-03 US disclosed
US-10325998-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-06-18 US disclosed
US-8793078-B2 Method for predicting activation energy using atomic fingerprint descriptor or atomic descriptor BIOINFORMATICS & MOLECULAR DESIGN RESEARCH CENTER (KR) 2014-07-29 US disclosed
US-8765613-B2 High selectivity nitride etch process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-07-01 US disclosed
US-20130105916-A1 HIGH SELECTIVITY NITRIDE ETCH PROCESS ZEON CORPORATION (JP) 2013-05-02 US disclosed
US-20130105996-A1 LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER ZEON CORPORATION (JP) 2013-05-02 US disclosed
US-20130108833-A1 HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER ZEON CORPORATION (JP) 2013-05-02 US disclosed
WO-2013062985-A1 HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-05-02 WO disclosed
WO-2013063182-A1 HIGH SELECTIVITY NITRIDE ETCH PROCESS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-05-02 WO disclosed
US-20120084012-A1 METHOD FOR PREDICTING ACTIVATION ENERGY USING ATOMIC FINGERPRINT DESCRIPTOR OR ATOMIC DESCRIPTOR BIOINFORMATICS & MOLECULAR DESIGN RESEARCH CENTER (KR) 2012-04-05 US disclosed
US-20110213558-A1 METHOD FOR PREDICTING ACTIVATION ENERGY USING AN ATOMIC FINGERPRINT DESCRIPTOR OR AN ATOMIC DESCRIPTOR BIOINFORMATICS & MOLECULAR DESIGN RESEARCH CENTER (KR) 2011-09-01 US disclosed
EP-2354987-A2 METHOD FOR PREDICTING ACTIVATION ENERGY USING AN ATOMIC FINGERPRINT DESCRIPTOR OR AN ATOMIC DESCRIPTOR Bioinformatics&Molecular Design Research Center (KR) 2011-08-10 EP disclosed