⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21625266 | 0.92 | — | — | |
| SCHEMBL4910438 | 0.89 | — | — | |
| SCHEMBL11507572 | 0.88 | — | — | |
| SCHEMBL895709 | 0.84 | THRB (0.30) | — | |
| SCHEMBL21625267 | 0.83 | — | — | |
| SCHEMBL2170771 | 0.83 | — | — | |
| SCHEMBL895996 | 0.76 | — | — | |
| SCHEMBL17133771 | 0.74 | — | — | |
| SCHEMBL22127702 | 0.73 | — | — | |
| SCHEMBL2170883 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170002221-A1 | UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2017-01-05 | — | — | US | claimed |
| US-12036806-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| WO-2024135086-A1 | PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE | 株式会社ダイセル | 2024-06-27 | — | — | WO | disclosed |
| US-12006440-B2 | Radiation curable inkjet inks for interior decoration | AGFA NV (BE) | 2024-06-11 | — | — | US | disclosed |
| WO-2024111420-A1 | ALKALI-SOLUBLE RESIN, LIGHT-SENSITIVE RESIN COMPOSITION, METHODS RESPECTIVELY FOR PRODUCING THOSE, AND USE OF THOSE | 株式会社日本触媒 | 2024-05-30 | — | — | WO | disclosed |
| US-11981823-B2 | Radiation-curable ink jet composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2024-05-14 | — | — | US | disclosed |
| US-11952501-B2 | Ink set and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2024-04-09 | — | — | US | disclosed |
| WO-2024053609-A1 | ALKALI-SOLUBLE RESIN, METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, MEMBER FOR DISPLAY DEVICE, AND DISPLAY DEVICE | 株式会社日本触媒 | 2024-03-14 | — | — | WO | disclosed |
| US-20240059823-A1 | CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF | CANON KK (JP) | 2024-02-22 | — | — | US | disclosed |
| US-20240059075-A1 | PHOTO-CURABLE INK JET INK SET AND INK JET RECORDING METHOD USING THE SAME | SEIKO EPSON CORPORATION (JP) | 2024-02-22 | — | — | US | disclosed |
| EP-2348081-A1 | ADHESIVE COMPOSITION AND OPTICAL MEMBER | Cheil Industries Inc. (KR) | 2011-07-27 | — | — | EP | disclosed |
| EP-1505090-B1 | REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION | NIPPON CATALYTIC CHEM IND (JP) | 2010-03-31 | — | — | EP | disclosed |
| EP-1967561-A1 | COATING AGENT FOR PLASTIC LABEL, AND PLASTIC LABEL | Fuji Seal International, Inc. (JP) | 2008-09-10 | — | — | EP | disclosed |
| EP-1308434-B1 | (Meth)acryloyl group-containing compound and method for producing the same | NIPPON CATALYTIC CHEM IND (JP) | 2006-03-15 | — | — | EP | disclosed |
| US-6887946-B2 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| EP-1505090-A1 | REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION | Nippon Shokubai Co., Ltd. (JP) | 2005-02-09 | — | — | EP | disclosed |
| US-6767980-B2 | ACTIVATED ENERGY RAY-CURABLE INK COMPOSITION FOR INK-JET PRINTING; VINYL ETHER GROUP-CONTAINING (METH)ACRYLIC ESTER | NIPPON SHOKUBAI CO., LTD. (JP) | 2004-07-27 | — | — | US | disclosed |
| US-20030199655-A1 | Reactive diluent and curable resin composition | NIPPON SHOKUBAI CO., LTD. | 2003-10-23 | — | — | US | disclosed |
| US-20030134926-A1 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| EP-1308434-A1 | (Meth)acryloyl group-containing compound and method for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2003-05-07 | — | — | EP | disclosed |