SCHEMBL8964899

SCHEMBL8964899

CCC(CC)(C(=O)C=Cc1ccc(O)c(OC)c1)C(=O)C=Cc1ccc(O)c(OC)c1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 5/20 0.69
CYP2D6 P10635 3/20 0.69
MAOB P27338 3/20 0.69
MAPT P10636 3/20 0.69
BACE1 P56817 3/20 0.69
CYP2C9 P11712 2/20 0.69
TSHR P16473 2/20 0.69
HSD17B10 Q99714 2/20 0.69
CYP1A2 P05177 2/20 0.69
ALOX5 P09917 2/20 0.69
NFKB1 P19838 2/20 0.69
HSD11B1 P28845 2/20 0.69
STAT3 P40763 2/20 0.69
NFKB2 Q00653 2/20 0.69
RELA Q04206 2/20 0.69
NFE2L2 Q16236 2/20 0.69
KDM4E B2RXH2 2/20 0.69
CA12 O43570 2/20 0.69
CA1 P00915 2/20 0.69
CA2 P00918 2/20 0.69

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8964897 1.00 APP (0.69) APPCYP2D6MAOBMAPTBACE1
SCHEMBL22618575 0.89 APP (0.66) APPCYP2D6MAOBMAPTBACE1
SCHEMBL21033682 0.87 APP (0.63) APPCYP2D6MAOBMAPTBACE1
SCHEMBL8965757 0.85 CYP2D6 (0.72) APPCYP2D6MAOBMAPTBACE1
SCHEMBL10001150 0.85 KMT2A (0.78) APPCYP2D6MAOBMAPTBACE1
SCHEMBL8965766 0.85 CYP2D6 (0.72) APPCYP2D6MAOBMAPTBACE1
SCHEMBL20585531 0.84 CYP2D6 (0.70) APPCYP2D6MAOBMAPTBACE1
SCHEMBL9440443 0.84 APP (0.63) APPCYP2D6MAOBMAPTBACE1
SCHEMBL3859807 0.82 APP (0.83) APPCYP2D6MAOBMAPTBACE1
SCHEMBL3859809 0.82 APP (0.83) APPCYP2D6MAOBMAPTBACE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed