SCHEMBL8965757

SCHEMBL8965757

COc1cc(/C=C/C(=O)C(C)(C)C(=O)/C=C/c2ccc(O)c(OC)c2)ccc1O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 3/20 0.72
NFKB1 P19838 3/20 0.72
CYP1A2 P05177 2/20 0.72
ALOX5 P09917 2/20 0.72
HSD11B1 P28845 2/20 0.72
STAT3 P40763 2/20 0.72
NFKB2 Q00653 2/20 0.72
RELA Q04206 2/20 0.72
NFE2L2 Q16236 2/20 0.72
APP P05067 3/20 0.70
KDM4E B2RXH2 2/20 0.70
CA12 O43570 2/20 0.70
CA1 P00915 2/20 0.70
CA2 P00918 2/20 0.70
CA3 P07451 2/20 0.70
PKM P14618 2/20 0.70
CA4 P22748 2/20 0.70
CA6 P23280 2/20 0.70
CA5A P35218 2/20 0.70
SNCA P37840 2/20 0.70

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965766 1.00 CYP2D6 (0.72) CYP2D6NFKB1CYP1A2ALOX5HSD11B1
SCHEMBL3858935 0.92 KMT2A (0.66) CYP2D6NFKB1CYP1A2ALOX5HSD11B1
SCHEMBL3858939 0.92 KMT2A (0.66) CYP2D6NFKB1CYP1A2ALOX5HSD11B1
SCHEMBL10001150 0.91 KMT2A (0.78) CYP2D6NFKB1CYP1A2ALOX5HSD11B1
SCHEMBL3863003 0.89 ALOX5 (0.62) CYP2D6NFKB1CYP1A2ALOX5HSD11B1
SCHEMBL3863009 0.89 ALOX5 (0.62) CYP2D6NFKB1CYP1A2ALOX5HSD11B1
SCHEMBL30130358 0.88 KMT2A (0.82) CYP2D6NFKB1CYP1A2NFE2L2KDM4E
SCHEMBL30130359 0.88 KMT2A (0.82) CYP2D6NFKB1CYP1A2NFE2L2KDM4E
SCHEMBL29497174 0.88 KMT2A (0.82) CYP2D6NFKB1CYP1A2NFE2L2KDM4E
SCHEMBL10054233 0.88 KMT2A (0.82) CYP2D6NFKB1CYP1A2NFE2L2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed