SCHEMBL8964956

SCHEMBL8964956

COc1ccccc1/C=C/C(=O)c1ccc(O)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 1.00
CTSL P07711 5/20 0.84
CTSB P07858 5/20 0.84
CAPN1 P07384 3/20 0.84
MAPT P10636 3/20 0.80
NPC1 O15118 2/20 0.80
LMNA P02545 2/20 0.80
BCHE P06276 1/20 0.80
RAB9A P51151 1/20 0.80
CYP1A2 P05177 2/20 0.76
CYP2D6 P10635 2/20 0.76
CYP3A4 P08684 1/20 0.76
CYP2C9 P11712 1/20 0.76
HPGD P15428 1/20 0.76
CYP2C19 P33261 1/20 0.76
RECQL P46063 1/20 0.76
GPR55 Q9Y2T6 1/20 0.76
TDP1 Q9NUW8 1/20 0.74
NR1H4 Q96RI1 3/20 0.72
CYP1A1 P04798 1/20 0.72

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29403206 1.00 MAOB (1.00) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL8964952 1.00 MAOB (1.00) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL1723179 0.89 MAPT (1.00) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL1723180 0.89 MAPT (1.00) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL19870465 0.88 MAOB (0.79) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL6357635 0.87 ALOX5 (0.78) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL6357636 0.87 ALOX5 (0.78) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL17670806 0.87 MAPT (0.78) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL15903154 0.87 MAPT (1.00) MAOBCTSLCTSBCAPN1MAPT
SCHEMBL15903156 0.87 MAPT (1.00) MAOBCTSLCTSBCAPN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111683986-B Composition for forming cured film, alignment material, and retardation material 日产化学株式会社 2025-01-10 CN disclosed
CN-119053661-A Composition for forming cured film, alignment material, and retardation material 日产化学株式会社 2024-11-29 CN disclosed
CN-119053888-A Resin composition for thermosetting photo-alignment film 日产化学株式会社 2024-11-29 CN disclosed
CN-118715462-A Resin composition for thermosetting photo-alignment film 日产化学株式会社 2024-09-27 CN disclosed
CN-112384834-B Cured film, alignment material, and retardation material 日产化学株式会社 2023-08-11 CN disclosed
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed