SCHEMBL8964978

SCHEMBL8964978

C=CC(=O)Oc1ccc(C(=O)/C=C/c2ccc(C)cc2)cc1

nearest known ligand 0.69

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAOB P27338 8/20 0.69
MAOA P21397 6/20 0.69
MAPT P10636 6/20 0.69
RAB9A P51151 2/20 0.61
POLB P06746 1/20 0.61
CYP1B1 Q16678 2/20 0.59
F3 P13726 2/20 0.59
ALDH1A1 P00352 2/20 0.59
CYP3A4 P08684 1/20 0.59
HPGD P15428 1/20 0.59
CYP1A1 P04798 1/20 0.56
BCHE P06276 1/20 0.54
XDH P47989 2/20 0.54
P4HB P07237 1/20 0.54
CALM1 P0DP23 1/20 0.54
MEN1 O00255 1/20 0.54
KMT2A Q03164 1/20 0.54
NPC1 O15118 1/20 0.52
LMNA P02545 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8964970 1.00 MAOB (0.69) MAOBMAOAMAPTRAB9APOLB
SCHEMBL20828533 0.93 F3 (0.63) MAOBMAOAMAPTRAB9ACYP1B1
SCHEMBL38652058 0.93 F3 (0.63) MAOBMAOAMAPTRAB9ACYP1B1
SCHEMBL7543059 0.85 CYP3A4 (0.66) MAOBMAOAMAPTRAB9ACYP1B1
SCHEMBL7543053 0.85 CYP3A4 (0.66) MAOBMAOAMAPTRAB9ACYP1B1
SCHEMBL10867827 0.85 CYP1B1 (0.66) MAOBMAOAMAPTRAB9ACYP1B1
SCHEMBL8964946 0.83 MAOB (0.66) MAOBMAOAMAPTRAB9APOLB
SCHEMBL10954435 0.83 MAOB (0.66) MAOBMAOAMAPTRAB9APOLB
SCHEMBL8964941 0.83 MAOB (0.66) MAOBMAOAMAPTRAB9APOLB
SCHEMBL10954426 0.83 MAOB (0.66) MAOBMAOAMAPTRAB9APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed