SCHEMBL8965203

SCHEMBL8965203

C=Cc1ccc(C(=O)C=Cc2ccc([N+](=O)[O-])cc2)cc1

nearest known ligand 0.74

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAOB P27338 8/20 0.74
MAOA P21397 5/20 0.74
BCHE P06276 1/20 0.73
CYP1B1 Q16678 1/20 0.73
HSPD1 P10809 1/20 0.66
HSPE1 P61604 1/20 0.66
CTSL P07711 1/20 0.64
CTSB P07858 1/20 0.64
ALDH1A1 P00352 1/20 0.59
LMNA P02545 1/20 0.59
MAPT P10636 1/20 0.59
PTPN1 P18031 2/20 0.59
KRAS P01116 2/20 0.56
PTPN12 Q05209 1/20 0.56
PTPN22 Q9Y2R2 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6733848 0.92 MAOB (0.85) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL6733854 0.92 MAOB (0.85) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL8965792 0.86 MAOB (0.76) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL8977012 0.86 MAOB (0.76) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL9136940 0.86 MAOB (0.80) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL9136943 0.86 MAOB (0.80) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL8977005 0.86 MAOB (0.76) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL8965786 0.86 MAOB (0.76) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL3049957 0.85 MAOB (1.00) MAOBMAOABCHECYP1B1HSPD1
SCHEMBL3041716 0.85 MAOB (0.74) MAOBMAOABCHECYP1B1HSPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed