SCHEMBL8965237

SCHEMBL8965237

C=Cc1ccc(C(=O)C=Cc2ccc(C(C)C)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.58
MAPK1 P28482 1/20 0.58
CXCL12 P48061 2/20 0.58
MAPT P10636 4/20 0.56
RAB9A P51151 5/20 0.54
SMN1; SMN2 Q16637 4/20 0.54
NPC1 O15118 3/20 0.54
HDAC4 P56524 1/20 0.53
HDAC1 Q13547 1/20 0.53
F3 P13726 2/20 0.53
MAOB P27338 6/20 0.53
MAOA P21397 3/20 0.53
TNFRSF1A P19438 1/20 0.51
POLB P06746 2/20 0.50
LMNA P02545 3/20 0.49
HTT P42858 2/20 0.49
MEN1 O00255 1/20 0.49
ALDH1A1 P00352 1/20 0.49
NFKB1 P19838 1/20 0.49
NFKB2 Q00653 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10070208 0.92 KDM4E (0.68) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL977740 0.86 MAPT (0.77) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL8965226 0.86 F3 (0.74) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL8965223 0.86 F3 (0.74) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL25198153 0.86 MAPK1 (0.65) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL25201069 0.86 F3 (0.74) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL977738 0.86 MAPT (0.77) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL8977082 0.86 F3 (0.74) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL8977086 0.86 F3 (0.74) KDM4EMAPK1CXCL12MAPTRAB9A
SCHEMBL10070191 0.84 CYP1B1 (0.68) KDM4EMAPK1CXCL12MAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed