SCHEMBL8965384

SCHEMBL8965384

C=Cc1ccc(C(=O)C=Cc2cc(OC)c(OC)c(OC)c2)cc1

nearest known ligand 0.75

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KRAS P01116 6/20 0.75
CA1 P00915 3/20 0.75
CA2 P00918 3/20 0.75
ALDH1A1 P00352 2/20 0.73
SMN1; SMN2 Q16637 2/20 0.73
ATM Q13315 1/20 0.73
L3MBTL1 Q9Y468 1/20 0.73
ABCG2 Q9UNQ0 5/20 0.69
CYP1A1 P04798 1/20 0.69
CYP1A2 P05177 1/20 0.69
CYP2C8 P10632 1/20 0.69
CYP2D6 P10635 1/20 0.69
CYP1B1 Q16678 1/20 0.69
ABCB1 P08183 2/20 0.68
KDM4E B2RXH2 1/20 0.67
LMNA P02545 1/20 0.67
MAPT P10636 1/20 0.67
MEN1 O00255 2/20 0.66
KMT2A Q03164 2/20 0.66
TUBB4A P04350 2/20 0.64

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13018517 0.86 KRAS (1.00) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL13018515 0.86 CA1 (1.00) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL19183065 0.86 CA1 (1.00) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL5653173 0.86 KRAS (0.79) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL615818 0.86 KRAS (1.00) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL5653179 0.86 KRAS (0.79) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL8965057 0.85 ABCG2 (0.68) CA1CA2ABCG2CYP1A1CYP1A2
SCHEMBL2448676 0.84 KRAS (1.00) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL31374858 0.84 KRAS (1.00) KRASCA1CA2ALDH1A1SMN1; SMN2
SCHEMBL2448671 0.84 KRAS (1.00) KRASCA1CA2ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed