SCHEMBL8965057

SCHEMBL8965057

C=Cc1ccc(C(=O)C=Cc2ccc(C)c(OC)c2)cc1

nearest known ligand 0.68

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 3/20 0.68
MEN1 O00255 1/20 0.68
KMT2A Q03164 1/20 0.68
CXCL12 P48061 7/20 0.62
TNFRSF1A P19438 1/20 0.61
CA1 P00915 3/20 0.60
CA2 P00918 3/20 0.60
CXCR4 P61073 1/20 0.57
CYP1A1 P04798 1/20 0.56
CYP1A2 P05177 1/20 0.56
CYP2D6 P10635 1/20 0.56
CYP1B1 Q16678 1/20 0.56
PDE4A P27815 1/20 0.55
PDE4B Q07343 1/20 0.55
PDE4C Q08493 1/20 0.55
PDE4D Q08499 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965097 0.89 ABCG2 (0.68) ABCG2MEN1KMT2ACXCL12TNFRSF1A
SCHEMBL30383073 0.88 CA1 (0.70) ABCG2MEN1KMT2ACXCL12TNFRSF1A
SCHEMBL8965726 0.88 CA1 (0.70) ABCG2MEN1KMT2ACXCL12TNFRSF1A
SCHEMBL8965729 0.88 CA1 (0.70) ABCG2MEN1KMT2ACXCL12TNFRSF1A
SCHEMBL16181228 0.85 ABCG2 (0.86) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL8965384 0.85 KRAS (0.75) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL8964936 0.84 MAPT (0.56) ABCG2MEN1KMT2A
SCHEMBL25688111 0.80 CYP1A2 (0.53) ABCG2CYP1A2CYP2D6
SCHEMBL8977121 0.80 ABCG2 (0.69) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL8977123 0.80 ABCG2 (0.69) ABCG2MEN1KMT2ATNFRSF1ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed