SCHEMBL8965401

SCHEMBL8965401

O=C(/C=C/c1ccccc1[N+](=O)[O-])c1ccc(O)cc1

nearest known ligand 0.81

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 4/20 0.81
MAPT P10636 8/20 0.77
ALDH1A1 P00352 4/20 0.77
RAB9A P51151 4/20 0.77
LMNA P02545 2/20 0.77
ATM Q13315 2/20 0.77
BACE1 P56817 1/20 0.67
MEN1 O00255 5/20 0.64
KMT2A Q03164 5/20 0.64
HSP90AA1 P07900 2/20 0.64
CYP1B1 Q16678 2/20 0.58
ALDH2 P05091 1/20 0.58
CYP3A4 P08684 1/20 0.58
HSPD1 P10809 1/20 0.58
CYP19A1 P11511 1/20 0.58
F3 P13726 1/20 0.58
MAOA P21397 1/20 0.58
HSPE1 P61604 1/20 0.58
TDP1 Q9NUW8 1/20 0.58
MITF O75030 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965397 1.00 MAOB (0.81) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL30449461 0.89 MAOB (1.00) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL5474931 0.89 MAOB (1.00) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL30209186 0.89 MAOB (1.00) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL5474937 0.89 MAOB (1.00) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL11804633 0.88 MAOB (0.81) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL14464471 0.87 MAPT (1.00) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL15807349 0.87 MAPT (1.00) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL8965702 0.85 MAOB (0.74) MAOBMAPTALDH1A1RAB9ALMNA
SCHEMBL14306015 0.83 MAPT (0.74) MAOBMAPTALDH1A1RAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed