SCHEMBL8965702

SCHEMBL8965702

C=Cc1ccc(C(=O)C=Cc2ccccc2[N+](=O)[O-])cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.74
ALDH1A1 P00352 7/20 0.71
MAPT P10636 6/20 0.71
LMNA P02545 4/20 0.71
RAB9A P51151 4/20 0.71
ATM Q13315 2/20 0.71
HSP90AA1 P07900 1/20 0.56
BACE1 P56817 1/20 0.55
CYP1B1 Q16678 1/20 0.55
AR P10275 1/20 0.53
MEN1 O00255 3/20 0.52
KMT2A Q03164 3/20 0.52
NPC1 O15118 3/20 0.51
SMN1; SMN2 Q16637 3/20 0.51
BCHE P06276 1/20 0.51
KDM4E B2RXH2 1/20 0.51
NFKB1 P19838 1/20 0.51
NFKB2 Q00653 1/20 0.51
RELA Q04206 1/20 0.51
HPGD P15428 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30209186 0.86 MAOB (1.00) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL30449461 0.86 MAOB (1.00) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL5474937 0.86 MAOB (1.00) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL5474931 0.86 MAOB (1.00) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL8965401 0.85 MAOB (0.81) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL11804633 0.85 MAOB (0.81) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL8965397 0.85 MAOB (0.81) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL15807349 0.83 MAPT (1.00) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL14464471 0.83 MAPT (1.00) MAOBALDH1A1MAPTLMNARAB9A
SCHEMBL14306015 0.80 MAPT (0.74) MAOBALDH1A1MAPTLMNARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed