SCHEMBL8965920

SCHEMBL8965920

CCCC1(C)CCCNC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19512652 0.94 SOS1 (0.31)
SCHEMBL24958339 0.92 ALDH1A1 (0.31)
SCHEMBL3253074 0.86
SCHEMBL10697164 0.82
SCHEMBL11890967 0.79
SCHEMBL6408324 0.78
SCHEMBL6408327 0.78 SLC6A2 (0.35)
SCHEMBL14139353 0.78
SCHEMBL3818633 0.77
SCHEMBL27814842 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013177269-A2 ZIRCONIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO claimed
WO-2013177292-A1 TITANIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO claimed
WO-2013177284-A1 HAFNIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO claimed
EP-3541381-B1 INHIBITORS OF FACTOR XIIA MERCK SHARP & DOHME LLC (US) 2022-12-28 EP disclosed
EP-3661941-B1 THIAZOLOPYRIDINE DERIVATIVES AS ADENOSINE RECEPTOR ANTAGONISTS MERCK PATENT GMBH (DE) 2022-12-14 EP disclosed
WO-2013177269-A2 ZIRCONIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO disclosed
WO-2013177292-A1 TITANIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO disclosed
WO-2013177284-A1 HAFNIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO disclosed
US-5554787-A CHEMICAL INTERMEDIATES FOR POLYURETHANES BASF AKTIENGESELLSCHAFT (DE) 1996-09-10 US disclosed
EP-0449110-B1 2,2-Dialkylpentane-1,5-diisocyanates, -diurethanes, and -dicarbamic acid chlorides, process for their preparation and their use BASF AG (DE) 1996-06-05 EP disclosed
EP-0452693-B1 Method of preparing 2,2-disubstituted pentane 1,5-diamines BASF AG (DE) 1995-10-04 EP disclosed
US-5166443-A PREPARATION OF 2,2-DISUBSTITUTED PENTANE-1,5-DIAMINES BASF AKTIENGESELLSCHAFT (DE) 1992-11-24 US disclosed
EP-0452693-A1 Method of preparing 2,2-disubstituted pentane 1,5-diamines BASF Aktiengesellschaft (DE) 1991-10-23 EP disclosed
EP-0449110-A2 2,2-Dialkylpentane-1,5-diisocyanates, -diurethanes, and -dicarbamic acid chlorides, process for their preparation and their use BASF Aktiengesellschaft (DE) 1991-10-02 EP disclosed